Symposium A – Amorphous and Microcrystalline Silicon Technology - 1997
Research Article
Preparation and Properties of Hydrogen Ated Amorphous Germanium Nitride a-GeNx:H
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- 15 February 2011, 543
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Investigations of Ultra-Thin Single Layer A-Si:H Films
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- 15 February 2011, 549
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Structural Relaxation of Vacancies in Amorphous Silicon
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- 15 February 2011, 555
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An AFM Study of The Effect of Growth Method and Conditions on The Microstructure of A-Si:H
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- 15 February 2011, 561
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In-Situ Monitoring of Surface Hydrogen on the a-SiGe:H Films
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- 15 February 2011, 567
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Defect Formation Mechanism During PECVD of a-Si:H
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- 15 February 2011, 573
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High-Rate PECVD of Low Defect Density a-Si:H on Large Areas
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- 15 February 2011, 579
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High-Rate Deposition of a-Si:H Films in 55 kHz Glow Discharge: Growth Mechanisms and Film Structure
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- 15 February 2011, 585
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Deposition Conditions for Large Area PECVD of Amorphous Silicon
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- 15 February 2011, 591
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Ion Bombardment and Disorder in Amorphous Silicon
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- 15 February 2011, 597
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Ion Bombardment in Silane VHF Deposition Plasmas
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- 15 February 2011, 603
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Role of The Gas Flow Parameters on The Uniformity of Films Produced by PECVD Technique
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- 15 February 2011, 609
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a-Si:H and a-SiGe:H Alloys Fabricated Close to Powder Regime of RF PECVD
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- 15 February 2011, 615
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Hydrogen Incorporation During Deposition of a-Si:H From an Intense Source of SiH3
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- 15 February 2011, 621
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Amorphous Silicon-Carbon Alloys and Amorphous Carbon from Direct Methane and Ethylene Activation by ECR
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- 15 February 2011, 627
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Single Wafer Amorphous Silicon Process Evaluation
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- 15 February 2011, 633
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Bombardment by Reflection - A Novel Method to Prepare High Quality Hydrogenated Amorphous Germanium by Anodic PCVD
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- 15 February 2011, 639
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Deposition of Device Quality Amorphous Silicon by Hot-Wire CVD
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- 15 February 2011, 645
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Fast Etching of Amorphous and Microcrystalline Silicon by Hot-Filament Generated Atomic Hydrogen
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- 15 February 2011, 651
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Observation of Improved Structural Ordering in Low H Content, Hot wire Deposited a-Si:H
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- 15 February 2011, 657
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