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Photochemical Decomposition of Trifluralin

Published online by Cambridge University Press:  12 June 2017

W. L. Wright  and
G. F. Warren
G. F. Warren
Affiliation:
Purdue University, Lafayette, Indiana
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Abstract

Exposures of trifluralin, α. α, α-trifluoro-2,6-dinitro-N, N-dipropyl-p-toluidine, coated on glass and soil surfaces were made to sunlight and to artificial light from a mercury-vapor source having a wavelength range of 300–700 millimicrons. Ultraviolet absorption spectra of irradiated samples exhibited progressive change with time and intensity of exposure. Exposures on a glass surface to sunlight for four to six hours resulted in a decrease in the plant growth inhibitory activity of trifluralin. Exposures on soil surtaces also indicated that photodegradation occurs, but at a much reduced rate.

Type
Research Article
Information
Weeds , Volume 13 , Issue 4 , October 1965 , pp. 329 - 331
Copyright
Copyright © 1965 Weed Science Society of America 

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References

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