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Development of an improved XRD sample holder

Published online by Cambridge University Press:  10 January 2013

Chi-Tang Li  and
William R. Albe
Chi-Tang Li
Affiliation:
Dow Corning Corporation, Midland, Michigan 48686-0994
William R. Albe
Affiliation:
Dow Corning Corporation, Midland, Michigan 48686-0994
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Abstract

A new and improved sample holder suited for small samples has been developed for X-ray diffractometry. This holder is made from a commercial semiconductor grade of silicon wafer grown and cut along the [100]-axis, i.e., Si(100). This new holder not only meets almost all basic requirements of an ideal holder, namely, flat and damage free surface, low background noise, few interference peaks, and desired shape with different cavity sizes, but also provides additional advantages for measuring crystallite sizes and mass absorption coefficients. Furthermore, this holder is easy to clean and has good appearance because of its polished surface. A U.S. patent has been issued and a commercialization effort is underway.

Type
Research Article
Information
Powder Diffraction , Volume 8 , Issue 2 , June 1993 , pp. 118 - 121
Copyright
Copyright © Cambridge University Press 1993

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References

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