We fabricated PMOS SPC-Si TFTs which show better current uniformity than ELA poly-Si TFTs and superior stability compare to a-Si:H TFT on a glass substrate employing alternating magnetic field crystallization. However the leakage current of SPC-Si TFT was rather high for circuit element of AMOLED display due to many grain boundaries which could be electron hole generation centers. We applied off-state bias annealing of VGS=5V, VDS=-20V in order to suppress the leakage current of SPC-Si TFT. When the off-state bias annealing was applied on the SPC-Si TFT, the electron carriers were trapped in the gate insulator by high gate-drain voltage (25V). The trapped electron carriers could reduce the gate-drain field, so that the leakage current of SPC-Si TFT was reduced after off-state bias annealing. . We also applied same off state bias annealing at SPC-Si TFT with 20,000 lx light illumination in order to verify the reduction of leakage current of SPC-Si TFT under light illumination. The leakage current of SPC-Si TFT was reduced successfully even under light illumination during off-state bias annealing. The off-state bias annealed SPC-Si TFT could be used as pixel element of high quality AMOLED display.

This paper presents our material studies on hydrogenated microcrystalline silicon (μc-Si:H) and microcrystalline silicon-germanium alloy (μc-Si1-xGex:H) thin films for the development of high efficiency p-i-n junction solar cells. In μc-Si:H solar cells, we have evaluated the structural properties of the intrinsic μc-Si:H layers grown by plasma-enhanced chemical vapor deposition at high deposition rates (>2 nm/s). Several design criteria for the device grade μc-Si:H are proposed in terms of crystallographic orientation, grain size and grain boundary passivation. Meanwhile, in μc-Si1-xGex:H solar cells, we have succeeded in boosting the infrared response of solar cell upon Ge incorporation up to x∼0.2. Nevertheless, a degradation of solar cell parameters is observed for large Ge contents (x>0.2) and thick i-layers (> 1 μm), which is attributed to the influence of the Ge dangling bonds that act as acceptorlike states in undoped μc-Si1-xGex:H. To improve the device performance, we introduce an oxygen doping technique to compensate the native defect acceptors in μc-Si1-xGex:H p-i-n solar cells.

Staggered bottom-gate hydrogenated nanocrystalline silicon (nc-Si:H) thin-film transistors (TFTs) were demonstrated on flexible colorless polyimide substrates. The dc and ac bias-stress stability of these TFTs were investigated with and without mechanical tensile stress applied in parallel to the current flow direction. The findings indicate that the threshold voltage shift caused by an ac gate-bias stress was smaller compared to that caused by a dc gate-bias stress. Frequency dependence of threshold voltage shift was pronounced in the negative gate-bias stress experiments. Compared to TFTs under pure electrical gate-bias stressing, the stability of the nc-Si:H TFTs degrades further when the mechanical tensile strain is applied together with an electrical gate-bias stress.

This paper reports on new experimental findings and conclusions regarding the pulsed-laser-induced melting-and-solidification behavior of PECVD a-Si films. The experimental findings reveal that, within the partial-melting regime, these a-Si films can melt and solidify in ways that are distinct from, and more complex than, those encountered in microcrystalline-cluster-rich LPCVD a-Si films. Specifically (1) spatially dispersed and temporally stochastic nucleation of crystalline solids occurring relatively effectively at the moving liquid-amorphous interface, (2) very defective crystal growth that leads to the formation of fine-grained Si proceeding, at least initially after the nucleation, at a sufficiently rapidly moving crystal solidification front, and (3) the propensity for local preferential remelting of the defective regions and grain boundaries (while the beam is still on) are identified as being some of the fundamental factors that can participate and affect how these PECVD films melt and solidify.

Microscopic characterization of mixed phase silicon thin films by conductive atomic force microscopy (C-AFM) was used to study the structure composed of conical microcrystalline grains dispersed in amorphous matrix. C-AFM experiments were interpreted using simulations of electric field and current distributions. Density of absorbed optical power was calculated by numerically solving the Maxwell equations. The goal of this study is to combine both models in order to simulate local photoconductivity for understanding the charge photogeneration and collection in nanostructured solar cells.

A technique to improve and accelerate aluminum induced crystallization (AIC) by hydrogen plasma is proposed in this paper. Raman spectroscopy and Secondary Ion Mass Spectrometry of crystallized poly-Si thin films show that hydrogen plasma radicals reduce the crystallization time of AIC. This technique shortens the annealing time from 10 hours to 4 hours and increases the Hall mobility from 22.1 cm2/V·s to 42.5 cm2/V·s. The possible mechanism of AIC assisted by hydrogen radicals will also be discussed.

Thin film silicon solar cells are attractive for photovoltaics; however, the poor charge transport in this material requires that the devices are thinner than the absorption length. Adequate absorption can nevertheless be achieved by light scattering at textured interfaces because light can get trapped inside the absorber layer if it is scattered into angles above the critical angle of total internal reflection. This situation can be identified with the propagation of a guided mode in a waveguide where silicon plays the role of the high index guiding medium and the interface texture serves to couple the incident light to modes via grating coupling. We present an experimental realization of a solar cell structure on a line grating where the enhanced photocurrent can be clearly related to resonant excitation of waveguide modes.

United Solar Ovonic has leveraged its history of making amorphous silicon solar cells on stainless steel substrates to develop amorphous silicon alloy (a-Si:H)-based solar cells and modules on ∼25 μm thick polymer substrate using high-throughput roll-to-roll deposition technology for space and near-space applications. The solar cells have a triple-junction a-Si:H/a-SiGe:H/a-SiGe:H structure deposited by conventional plasma enhanced CVD (PECVD) using roll-to-roll processing. The cells have distinct advantages in terms of high specific power (W/kg), high flexibility, ruggedness, rollability for stowage, and irradiation resistance. The large area (23.9 cm x 32.1 cm) individual cells manufactured in large quantity can be readily connected into modules and have achieved initial, 25 °C, AM0 aperture-area efficiency of 9.8% and initial specific power of 1200 W/kg. We have conducted light-soak studies and measured the temperature coefficient of the current-voltage characteristics to determine the stable values at an expected operating temperature of 60 °C. The stable total-area efficiency and specific power at 60 °C are 7.2% and 950 W/kg, respectively. In this paper, we review the challenges and progress made in development of the cells, highlight some applications, and discuss current efforts aimed at improving performance.

A prototype expanded-beam spectroscopic ellipsometer has been developed that uses uncollimated (non-parallel, diffuse) illumination with a detection system consisting of an angle-of-incidence-sensitive pinhole camera for high-speed, large-area imaging/mapping applications. The performance of this novel instrument is being tested for imaging/mapping of mixed-phase hydrogenated silicon films having graded amorphous (a-Si:H) and nanocrystalline (nc-Si:H) components throughout the film depth. The speed of the measurement system makes the instrument suitable for use on production lines. The precision enables detection of subnanometer thicknesses, and refractive index and extinction coefficient changes of 0.01. Angle-of-incidence and mirror calibrations are made via well-known sample structures. Alternative commercial instrumentation for mapping by spectroscopic ellipsometry must translate the sample or ellipsometer in two dimensions. For this instrumentation, even a 15 × 15 cm2 sample with cm2 resolution requires > 200 measurements and at least 15 min. By imaging along one dimension in parallel, the expanded-beam system can measure with similar resolution in < 2 min. The focus of recent instrumentation efforts is on improving the overall system spectral range and its performance.

We report on the fabrication and characterization of n+-n-i-δi-p thin-film photodiodes with an active region comprising a hydrogenated nanocrystalline silicon (nc-Si:H) n-layer and a hydrogenated amorphous silicon (a-Si:H) i-layer. The combination of wide- and narrow-gap absorption layers enables the spectral response extending from the near-ultraviolet (NUV) to the near-infrared (NIR) region. Moreover, in the low-bias range, when only the i-layer is depleted, the leakage current is significantly lower than that in the conventional nc-Si:H n+-n-p+ photodiode deposited under the same deposition conditions. Device with the 900nm/400nm thick n-i-layers exhibits a reverse dark current density of 3 nA/cm2 at −1V. In the high-bias range, when the depletion region expands within the n-layer, the magnitude of the leakage current depends on electronic properties of nc-Si:H. The density of shallow and deep states, and diffusion length of holes in the n-layer have been estimated from the capacitance-voltage characteristics and from the bias dependence of the long-wavelength response, respectively. To improve the quantum efficiency in the NIR-region, we have also implemented a Cr / ZnO:Al back reflector. The observed long-wavelength spectral response is about twice as high as that for a reference photodiode without ZnO:Al layer. Results demonstrate the feasibility of the photodiode for low-level light detection in the NUV-to-NIR spectral range.

We present a procedure for calibrating tandem thin film photovoltaic modules under natural sunlight. The distinct steps involve pre-conditioning via light soaking, spectral response measurements and I-V measurements under natural sunlight. The measurements were done using a crystalline silicon reference cell as well as two filtered reference cells designed to spectrally match the top and bottom junctions in the tandem module.

Silicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(–H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.

A monolithic double pi’n/pin a-SiC:H device that combines the demultiplexing operation with the simultaneous photodetection and self amplification of the signal is analyzed under different electrical and optical bias conditions at low and high excitation frequencies. Results show that the transducer is a bias wavelength current-controlled device that make use of changes in the wavelength of the background to control the power delivered to the load. Self optical bias amplification or quenching under uniform irradiation and transient conditions is achieved. The device acts as an optical amplifier whose gain depends on the background wavelength and frequency. An optoelectronic model supported by an electrical simulation explains the operation of the optical system.

We have prepared n-type hydrogenated microcrystalline silicon oxide films (n μc-SiO:H) and investigated their structural, electrical and optical properties. Raman spectra shows that, amorphous phase of the n μc-SiO:H films tends to increase when the CO2/SiH4 ratio increases from 0 to 0.28 resulting in a reduction of the crystalline volume fraction (Xc) from 70 to 12%. Optical bandgap (E04) becomes gradually wider while dark conductivity and refractive index (n) continuously drop with increasing CO2/SiH4 ratio. The n μc-SiO:H films have been practically applied as a n layer in top cell of a-SiO:H/μc-Si:H micromorph silicon solar cells. We found that, open circuit voltage (Voc) and fill factor (FF) of the cells gradually increased, while short circuit current density (Jsc) remained almost the same value with increasing CO2/SiH4 ratio for n top layer deposition up to 0.23. The highest initial cell efficiency of 10.7% is achieved at the CO2/SiH4 ratio of 0.23. The enhancement of the Voc is supposed to be due to a reduction of reverse bias at sub cell connection (n top/p bottom interface). An increase of shunt resistance (Rsh) which is caused by a better tunnel recombination junction contributes to the improvement in the FF. Quantum efficiency (QE) results indicate no difference between the cells using n top μc-SiO:H and the cells with n top μc-Si:H layers. These results reveal that, the n μc-SiO:H films in this study do not work as an intermediate reflector to enhance light scattering inside the solar cells, but mainly play a key role to allow ohmic and low resistive electrical connection between the two adjacent cells in the micromorph silicon solar cells.

Photoluminescence (PL) spectra obtained with correlated set of experiments investigating grain boundary characteristics and diffusion processes in nanocrystalline silicon alloys (nc-Si:H), provide insight regarding formation and passivation of electronic defects in these regions. Based upon current results and previous works we believe thermally driven processes induce a PL band centered at 0.7 eV upon thermal annealing, and most likely involve diffusion of hydrogen and oxygen near interfaces. A nc-Si:H sample set with varied crystal volume fraction, Xc, was subject to thermal annealing treatments at different temperatures – each exceeding the deposition temperature. Fourier-transform photoluminescence (FTPL) and Fourier-transform infrared absorption spectroscopy (FTIR), were employed to correlate the relative 0.7 eV defect band emergence with compositional changes indicative of Si–Hx and Si–O species, for each sample, at each temperature, respectively. Hydrogen effusion data provide additional perspective.

We find the Xc to strongly affect susceptibility of nc-Si:H to oxygen related effects. The higher the Xc, the more readily oxygen penetrates the nc-Si:H network. We attribute this relationship to elevated diffusivity of oxygen in highly crystalline nc-Si:H materials, owing to their abundance of gain boundaries and interfaces, which serve as pathways for impurity migration. These findings corroborate the expectation that oxygen impurities and diffusion processes contribute to development of microstructural features giving rise to radiative recombination through deep defects in nc-Si:H.

Light-induced metastability of amorphous/microcrystalline (micromorph) silicon tandem solar cell, in which the microcrystalline bottom cell was deposited in a single-chamber system, has been studied under a white light for more than 1000 hours. Two different light-induced metastable behaviors were observed. The first type was the conventional light-induced degradation, where the open-circuit voltage (Voc), fill factor (FF), and short-circuit current density (Jsc) were degraded, hence the efficiency was degraded as well. This phenomenon was observed mainly in the tandem cells with a bottom cell limited current mismatch. The second type was with a light-induced increase in Voc, which sometimes resulted in an increase in efficiency. The second type of light-induced metastability was observed in the tandem cells with a top cell limited current mismatch. The possible mechanisms for these phenomena are discussed.

Silver can be used as the back contact and reflector in thin film silicon solar cells. When deposited on textured substrates, silver films often exhibit reduced reflectance due to absorption losses by the excitation of surface plasmon resonances. We show that thermal annealing of the silver back reflector increases its reflectance drastically. The process is performed at low temperature (150°C) to allow the use of plastic sheets such as polyethylene naphthalate and increases the efficiency of single junction amorphous solar cells dramatically. We present the best result obtained on a flexible substrate: a cell with 9.9% initial efficiency and 15.82 mA/cm2 in short circuit current is realized in n-i-p configuration.

The hydrogenated amorphous silicon (a-Si:H) single-junction thin-film solar cells were fabricated on SnO2:F-coated glasses by plasma-enhanced chemical vapor deposition (PECVD) system. The boron-doped amorphous silicon carbide (a-SiC:H) was served as the window layer (p-layer) and the undoped a-SiC:H was used as a buffer layer (b-layer). The optimization of the p/b/i/n thin-films in a-Si:H solar cells have been carried out and discussed. Considering the effects of light absorption, electron-hole extraction and light-induced degradation, the thicknesses of p, b, n and i layers have been optimized. The optimal a-Si:H thin-film solar cell having an efficiency of 9.46% was achieved, with VOC=906 mV, JSC=14.42 mA/cm2 and FF=72.36%.

In this paper we show that a flash lamp can be employed to induce controlled lateral solidification of a-Si thin films. Specifically, a dual xenon-arc-lamp-based system was utilized to induce location-controlled complete melting by shaping the incident beam using a contact mask. The resulting laterally solidified microstructure consisted of exceptionally long grains (~10s to ~100s of μm) that were relatively free of intragrain-defects. With further development and optimization, the approach may lead to cost-effective/high-throughput processes and systems that can capture and enhance the advantages of laser-based/melt-mediated crystallization techniques.

Hydrogenation of polycrystalline silicon thin-film solar cells is performed to improve the one-sun open-circuit voltage (Voc) of the device. Voc is found to increase linearly with increasing hydrogenation temperature and then saturates. For planar and textured samples, the Voc saturates at about 340 ºC and 307 ºC respectively. The low hydrogenation temperature helps to lower thermal budget during industrial process. Arrhenius plot of Voc prior to the saturation shows that the textured samples have lower activation energies than the planar sample. The activation energies of samples 188 (planar), 788 (textured) and 888 (textured) are 1.31 eV, 0.86 eV and 0.92 eV, respectively. The lower activation energies of the textured samples could be due to the shorter diffusion thickness and the increased surface area that is exposed to the hydrogen plasma.