Diamond films were deposited by microwave plasma CVD using H2 and CH4 gas mixture over various substrate materials such as Si, Pd, Be, Cu, Mo, AIN, SiO2, Si3N4, Al2O3, Sapphire, Quartz, Ni-base alloys, single crystal Ni, boron nitride, and Ti. We have used a Z-axis pull stud test to determine adhesion strength of diamond film to some of the substrates. Our observations on the adhesion of diamond films to the above substrates are reported. A method will be described to evaluate Young's modulus of CVD diamond films using fabricated diamond cantilever beams.