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ZnO Thin Films Grown at Various Substrate Angles by Pulsed Laser Deposition

Published online by Cambridge University Press:  01 February 2011

Sang Yeol Lee
Affiliation:
Department of Electrical and Electronic Engineering, Yonsei University, 134 Shinchon-dong, Seodaemoon-ku, Seoul, 120-749, Korea
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Abstract

ZnO thin films were grown with different plume-substrate angles and growth times by pulsed laser deposition. The angles between plume propagation direction and substrate plane were changed from 0°, 45° to 90°. The growth time was changed in order to adjust film thickness. From the XRD pattern exhibiting dominant (002) XRD peak of ZnO, all films were found to be c-axis oriented. Optical property of ZnO thin films were investigated by PL(Photoluminescence). The ratio of UV/green luminescent intensity of ZnO thin film increased, as the angle between plume and substrate plane decrease from 90° to 0°.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

1. Nakamura, Y., Yamada, Y., Kusumori, T., Minoura, H., Muto, H., Thin Solid Films, 411, 60 (2003).Google Scholar
2. Tang, Z. K., G.. Wong, K. L., Yu, P., Kawasaki, M., Ohtomo, A., Koinuma, H., Segawa, Y., Appl. Phys. Lett. 72, 3270 (1998).Google Scholar
3. Bae, S. H., Lee, S. Y., Kim, H. Y., Im, S., Optical Materials 17, 327 (2001).Google Scholar
4. Shim, E. S., Kang, H. S., Kang, J. S., Kim, J. H., Lee, S. Y., Applied Surface Science 186, 474 (2002).Google Scholar
5. Hu, W. S., Kiu, Z. G., Sun, J, Zhu, S. N., Xu, Q. Q., Feng, D., Ji, Z. M., Journal of Physics and Chemistry of Solids, 58, 459 (1997).Google Scholar
6. Chen, Y., Bagnall, D. M., Koh, H. J., Park, K. T., Hiraga, K., Zhu, Z., Yao, T., J. Appl. Phys. 84, 3912 (1998).Google Scholar
7. Kang, H. S., Kang, J. S., Pang, S. S., Shim, E. S., Lee, S. Y.. Materials Science and Engineering B (In press), (2003)Google Scholar
8. Bylander, E. G., J. Appl. Phys. 49, 1188 (1978).Google Scholar
9. Vangeusden, K., Seager, C. H., Warren, W. L., Tallant, D. R., Voiget, J. A., Appl. Phys. Lett. 68, 403 (1996).Google Scholar
10. Liu, M., Kitai, A. H., Mascher, P., J. Lumin. 54, 35 (1992).Google Scholar