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A View of the Commercial Application of Ion Implantation for Silicon VLSI Manufacturing

Published online by Cambridge University Press:  22 February 2011

Michael I. Current
Michael I. Current*
Affiliation:
Applied Materials, 3050 Bowers Avenue, Santa Clara, CA 95054 USA
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Abstract

The development of ion implantation for doping of Si-IC devices is reviewed with a special focus on some of the commercial as well as technological factors.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 297
Copyright
Copyright © Materials Research Society 1994

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References

References:

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