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Ultrapure Iron Film Formation by Mass-Separated Ion Beam Deposition Method
Published online by Cambridge University Press: 25 February 2011
Abstract
Isotopically enriched iron (56Fe or 57Fe) films were deposited on Si(100) substrates at RT by a low-energy (50–500 eV), mass-separated ion beam deposition (IBD) method. All the IBD-Fe films had smooth and fine-grained polycrystalline bcc-structure, and showed superior electrochemical corrosion resistance against both NaCl and H2SO4 solutions compared with die highest-purity (RRRIH=6000) iron metals ever reported. A distinct energy dependence of the degree of corrosion resistance and different microcrystalline structures observed by TEM cross-sections for the 50 eV- and 100 eV-IBD-Fe films indicate that their film growth modes are completely different.
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- Copyright © Materials Research Society 1993
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