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Synthesis of Nano/Meso-Structured Silicon Films by Plasma Deposition

Published online by Cambridge University Press:  14 April 2016

William W. Hernández-Montero ,
Carlos Zúñiga-Islas ,
Francisco J. De la Hidalga-Wade ,
Wilfrido Calleja-Arriaga  and
Adrián Itzmoyotl-Toxqui
William W. Hernández-Montero
Affiliation:
Departamento de Electrónica, Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), Apartado Postal 51 y 216, CP 72000, Tonantzintla, Puebla, México
Carlos Zúñiga-Islas
Affiliation:
Departamento de Electrónica, Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), Apartado Postal 51 y 216, CP 72000, Tonantzintla, Puebla, México
Francisco J. De la Hidalga-Wade
Affiliation:
Departamento de Electrónica, Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), Apartado Postal 51 y 216, CP 72000, Tonantzintla, Puebla, México
Wilfrido Calleja-Arriaga
Affiliation:
Departamento de Electrónica, Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), Apartado Postal 51 y 216, CP 72000, Tonantzintla, Puebla, México
Adrián Itzmoyotl-Toxqui
Affiliation:
Departamento de Electrónica, Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), Apartado Postal 51 y 216, CP 72000, Tonantzintla, Puebla, México
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Abstract

The characteristics of silicon films deposited by plasma depend strongly on the reactor parameters. In our experiments, the two-level factorial design was implemented. Pressure, silane and hydrogen flows were set at high and low values for the synthesis of silicon films. Results showed that the flows of silane and hydrogen played a key role, being the influence of pressure low. In particular, the samples at high level of hydrogen exhibited the lowest deposition rate and photosensitivity. On the other hand, the samples at low level of hydrogen showed crystalline regions and high deposition rate. For the lowest dilution ratio, nano/meso-structured silicon films were obtained, showing high photosensitivity and high roughness that increases the scattering of light. These characteristics of our films make them suitable to be used in photovoltaics.

Keywords

Siplasma-enhanced chemical vapor deposition (RF-PECVD)AFM
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1817: Symposium 1D – Nanostructured Materials and Nanotechnology—2015 , 2016 , imrc2015abs226
Copyright
Copyright © Materials Research Society 2016 

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References

REFERENCES

Street, R. A., Hydrogenated Amorphous Silicon, (Cambridge University Press, Cambridge, 1991).10.1017/CBO9780511525247CrossRefGoogle Scholar
Poortmans, J. and Arkhipov, V., Thin film solar cells: Characterization and Applications, (John Wiley & Sons, Chichester, 2011).Google Scholar
Meier, J., Flückiger, R., Keppner, H., and Shah, A, Appl, Phys. Lett., 65 (7), (1994).10.1063/1.112183CrossRefGoogle Scholar
Roca i Cabarrocas, P., “Plasma deposition of silicon clusters: A way to produce silicon thin films with medium range order,” MRS Spring Meeting, MRS Proceedings, 507, (1998).Google Scholar
Roca i Cabarrocas, P., Fontcuberta i Morral, A., Lebib, S., and Poissant, Y., Pure Appl. Chem., Vol. 74, No. 3, (2002).Google Scholar
Archer, M. D. and Nozik, A. J., Nanostructured and photoelectrochemical system for solar photon conversion, (Imperial College Press, London, 2008).10.1142/p217CrossRefGoogle Scholar
Yu, Z., Raman, A., and Fan, S., PNAS, Vol. 107, No. 41, (2010).Google Scholar
Montgomery, D. C., Design and analysis of experiments, 5th ed., (Wiley, New York, 2001).Google Scholar
Ferlauto, A. S., Koval, R. J., Wronski, C. R., Collins, R. W., Appl. Phys. Lett., 80, 2666 (2002).10.1063/1.1469661CrossRefGoogle Scholar
Kim, Ka-Hyun, PhD. Thesis, École polytechnique ParisTech, 2012.Google Scholar
Tolstoy, V. P., Chernyshova, I. V., and Skryshevsky, V. A., Handbook of Infrarred Spectroscopy of Ultrathin Films, (John Wiley & Sons, New Jersey, 2003).10.1002/047123432XCrossRefGoogle Scholar
Droz, C., Vallat-Sauvin, E., Bailat, J., Feitknectht, L., Meier, J., and Shah, A., Solar Energy Materials and Solar Cells, 81, (2004).10.1016/j.solmat.2003.07.004CrossRefGoogle Scholar
Sancho-Parramon, J., Gracin, D., Modreanu, M., and Gajović, A., Solar Energy Materials and Solar Cells, 93, (2009).10.1016/j.solmat.2009.06.008CrossRefGoogle Scholar