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The Phase Transition of Bi-Pt Alloys at the Interface of Pt/SrBi2Ta2O9 and its Effect on Interface Roughness

Published online by Cambridge University Press:  10 February 2011

Dong Suk Shin
Affiliation:
Semiconductor Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul, Korea Materials Science Department, Korea University, 1, 5Ka, Anam-Dong, Sungbuk-Ku, Seoul, 136-701, Korea
Ho Nyung Lee
Affiliation:
Semiconductor Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul, Korea
Yong Tae Kim
Affiliation:
Semiconductor Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul, Korea, [email protected]
Young K. Park
Affiliation:
Semiconductor Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul, Korea
In-Hoon Choi
Affiliation:
Materials Science Department, Korea University, 1, 5Ka, Anam-Dong, Sungbuk-Ku, Seoul, 136-701, Korea
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Abstract

Pt/SrBi2Ta2O9(SBT)/CeO2/Si (MFIS) structures were investigated for observing the change of electrical properties and morphology of interface of Pt/SBT after post-annealing of Pt top electrodes. The morphology of Pt/SBT interface became smooth and Bi oxide was formed at the bottom of Pt top electrode after post-annealing Pt top electrode. In order to describe the origin of these changes, Bi-oxide/Pt/SiO2/Si structure was investigated with annealing temperatures about the reaction between Bi oxide and Pt. We can describe that the smooth interface of Pt/SBT and the consumption of metallic Bi, which the reason why electrical properties were drastically improved, is induced by the melting of Pt-Bi alloys and formation of Bi-oxide after post-annealing Pt top electrode.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

1. Aroujo, C. A. Paz de, Cuchiaro, J. D., McMillan, L. M., Scott, M. C. and Scott, J. F., Science 347, 627 (1995).Google Scholar
2. Watanabe, H., Mihara, T., Yoshimori, H., and Aroujo, C. A. Paz de, Jpn. J. Appl. Phys. 34, 5240 (1995).Google Scholar
3. Noguchi, T., Hase, T. and Miyasaka, Y., Jpn. J. Appl. Phys. 35, 4900 (1996).Google Scholar
4. Shin, D. S., Lee, H. N., Lee, C. W., Kim, Y. T. and Choi, I. H., Jpn. J. Appl. Phys. 37, 5189 (1998).Google Scholar