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Optimisation and Simulation of an Alternative nano-flash Memory: the SASEM device.
Published online by Cambridge University Press: 01 February 2011
Abstract
Process simulation are performed in order to simulate the full fabrication process of an alternative nano-flash memory in order to optimise it and to improve the understanding of the dot storage formation. The influence of various parameters (oxidation temperature, nanowire shape) have been investigated.
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- Research Article
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- Copyright © Materials Research Society 2005
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