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Growth and Microstructure of Aluminum Nitride Thin Films

Published online by Cambridge University Press:  26 February 2011

M. Grant Norton ,
Paul G. Kotula ,
Jian Li ,
Stuart Mckernan ,
Kathryn P.B. Cracknell ,
C. Barry Carter  and
James W. Mayer
M. Grant Norton
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
Paul G. Kotula
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
Jian Li
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
Stuart Mckernan
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
Kathryn P.B. Cracknell
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
C. Barry Carter
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
James W. Mayer
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
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Abstract

The synthesis of aluminum nitride thin films by pulsed-laser ablation is demonstrated. The films were formed on single-crystal sapphire and graphite substrates. A number of techniques were used to characterize the films: transmission and scanning electron microscopy, Rutherford backscattering spectrometry and x-ray diffraction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 226: Symposium H – Mechanical Behavior of Materials and Structures in Microelectronics , 1991 , 209
Copyright
Copyright © Materials Research Society 1991

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References

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