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Determination of Hydrogen in Metals, Semiconductors, and Other Materials by Cold Neutron Prompt Gamma-Ray Activation Analysis

Published online by Cambridge University Press:  10 February 2011

R. L. Paul  and
R. M. Lindstrom
R. L. Paul
Affiliation:
Analytical Chemistry Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
R. M. Lindstrom
Affiliation:
Analytical Chemistry Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

Cold neutron prompt gamma-ray activation analysis has proven useful for nondestructive measurement of trace hydrogen. The sample is irradiated in a beam of neutrons; the presence of hydrogen is confirmed by the emission of a 2223 keV gamma-ray. Detection limits for hydrogen are 3 mg/kg in quartz and 8 mg/kg in titanium. We have used the technique to measure hydrogen in titanium alloys, germanium, quartz, fullerenes and their derivatives, and other materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 513: Symposium H – Hydrogen in Semiconductors and Metals , 1998 , 185
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1 Meyn, D. A., Metall. Trans. 5, pp. 2405–2414 (1974).Google Scholar
2. Pearton, S. J., Corbett, J. W., and Shi, T.-S, Appl. Phys. A. 43, p. 153 (1987).Google Scholar
3. Pankove, J. I., Carlson, D. E., Berkeyheiser, J. E., and Wance, R. O., Phys. Rev. Lett. 51 p. 2224 (1983).Google Scholar
4. Hall, R. N., IEEE Trans. Nucl. Sci. NS–21 (1), p. 260 (1974).Google Scholar
5. Hall, R. N., Inst. Phys. Conf. Ser. 23, p. 190 (1975).Google Scholar
6. Neumann, D. A., Copley, J. R. D., Reznik, D., Kamitakahara, W. A., Rush, J. J., Paul, R. L., and Lindstrom, R. M., J. Phys. Chem. Solids 54, p. 1699 (1993).Google Scholar
7. Lindstrom, R. M., J. Res. Nat. Inst. Stand. Techn 98, p. 127 (1993).Google Scholar
8. Prask, H. J., Rowe, J. M., Rush, J. J., Schröder, I. G., J. Res. Nat. Inst. Stand. Tech., 98, p. 1 (1993).Google Scholar
9. Paul, R. L., Lindstrom, R. M., Vincent, D. H., J. Radioanal. Nucl. Chem. 180, p. 263 (1994).Google Scholar
10. Mackey, E. A., Anderson, D. L., Chen, H., Downing, R. G., Greenberg, R. R., Lamaze, G. P., Lindstrom, R. M., Mildner, D. F. R., and Paul, R. L., J. Radioanal. Nucl. Chem, 203 (2), p. 411 (1996).Google Scholar
11. Paul, R. L., Analyst 122, p. 35R (1997).Google Scholar
12. Paul, R.L., Lindstrom, R. M., Heald, A. E., J. Radioanal. Nucl. Chem., 215(1997)63–68.Google Scholar
13. Lindstrom, R. M., Biol. Trace Elem. Res. 43–45, p. 597 (1994).Google Scholar
14. Guide to the Expression of Uncertainty in Measurement, ISBN 92-67-10188-9, 1st edn. ISO, Switzerland, 1993.Google Scholar
15. Copley, J. R. D. and Stone, C. A., Nucl. Instrum Meth. A281, p. 593 (1989).Google Scholar
16. Mackey, E. A., Gordon, G. E., Lindstrom, R. M., and Anderson, D. L., Anal. Chem. 63, p. 288 (1991).Google Scholar
17. Mackey, E. A., Gordon, G. E., Lindstrom, R. M., and Anderson, D. L., Anal. Chem. 64, p. 2366 (1992).Google Scholar
18. Mackey, E. A. and Copley, J. R. D., J. Radioanal. Nucl. Chem. 167, p. 127 (1993).Google Scholar
19. Paul, R. L. and Mackey, E. A., J. Radioanal. Nucl. Chem. 181, p. 321 (1994).Google Scholar
20. Paul, R. L., J. Radioanal. Nucl. Chem. 191, p. 245 (1995).Google Scholar
21. Currie, L. A., Anal. Chem. 40, p. 586 (1968).Google Scholar
22. Paul, R. L. and Lindstrom, R. M., in Diagnostic Techniques for Semiconductor Processing, edited by Glembocki, O. J., Pang, S. W., Pollak, F. H., Crean, G. M., Larrabee, G., (Mater. Res. Soc. Proc. 324, Pittsburgh, PA 1994), pp. 403–408.Google Scholar
23. Paul, R. L., Lindstrom, R. M., in Review of Progress in Quantitative Nondestructive Evaluation, vol.13, edited by Thompson, D. O. and Chimenti, D. E., Plenum Press, New York, 1994, pp. 1619–1624.Google Scholar
24. Paul, R. L., Privett, H. M. III, Lindstrom, R. M., Richards, W. J., and Greenberg, R. R., Metallurgical and Materials Transactions A 27A, p. 3682 (1996).Google Scholar
25. Lindstrom, R. M., Paul, R. L., these proceedings, paper H8.19.Google Scholar
26. Sanders, P. G., Weertman, J. R., Barker, J. G., Siegel, R. W., in Molecularly Designed Ultrafine/Nanostructural Materials, 351, edited by. K. E. Gonsaves, G.M. Chow, T. D. Xiao, and R. C. Cammarata, (Mater. Res. Soc. Proc. 351, Pittsburgh, PA 1994), pp. 319–324.Google Scholar
27. Sanders, P. G., Weertman, J. R., and Barker, J. G., J. Mater. Res. 11, p. 3110 (1996).Google Scholar
28. Krug, F., Schober, T., Paul, R., Springer, T., Solid State lonics 77, p. 185 (1995).Google Scholar