Hostname: page-component-6bf8c574d5-mcfzb Total loading time: 0 Render date: 2025-03-09T22:13:55.174Z Has data issue: false hasContentIssue false
  • English
  • Français

An Investigation of in Situ Chlorination of Tungsten

Published online by Cambridge University Press:  25 February 2011

N. Thomas ,
E. Blanquet ,
C. Vahlas ,
C. Bernard  and
R. Madar
N. Thomas
Affiliation:
Laboratoire de Thermodynamique et Physico-Chimie Métallurgiques, E.N.S.E.E.G, BP.75, 38402 Saint Martin d'Hères, France
E. Blanquet
Affiliation:
Laboratoire de Thermodynamique et Physico-Chimie Métallurgiques, E.N.S.E.E.G, BP.75, 38402 Saint Martin d'Hères, France
C. Vahlas
Affiliation:
Laboratoire de Thermodynamique et Physico-Chimie Métallurgiques, E.N.S.E.E.G, BP.75, 38402 Saint Martin d'Hères, France
C. Bernard
Affiliation:
Laboratoire de Thermodynamique et Physico-Chimie Métallurgiques, E.N.S.E.E.G, BP.75, 38402 Saint Martin d'Hères, France
R. Madar
Affiliation:
INPG - ENSPG, LMGP, BP.46, 38402 Saint Martin d'Hè1res, France
Get access

Abstract

A thermodynamic and experimental study of in-situ chlorination of tungsten is presented. When gaseous tungsten chlorides are used as metal precursors for tungsten and tungsten silicide CVD, their direct synthesis provide a reproductible volatile chloride source.

The conditions leading to the best production of volatile tungsten chlorides have been optimized by means of thermodynamic calculations. The influence of the different production parameters (temperature, nature of reactant gas, …) have been determined.

During some chlorination experiments, volatile chlorides have been detected in-situ by a quadrupole mass spectrometer.

Good agreement between theoretical and experimental results is obtained.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 204: Symposium E – Chemical Perspectives of Microelectronic Materials II , 1990 , 451
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1- Pauleau, Y., Proceedings of NATO Advanced Study Institute, Levy, R.A., ed., M. Nijhoff Publishers, Dordrecht, the Netherlands, Chap. 13 (1988).Google Scholar
2- Chen, J.R., Fang, Y.K., Hsu, S.L., Appl. Surf. Sc., 33/34, 578–586 (1988).Google Scholar
3- Bernard, C., Vahlas, C., Million-Brodaz, J.F., Madar, R., Proceedings of the X Int. Conf. on CVD, Cullen, G.W. ed., Electrochemical Soc., Pennington, NJ (1987) p.700.Google Scholar
4- Pauleau, Y., Bulletin de la Socidtd Chimique de France, 4, 583–593 (1985).Google Scholar
5- JANAF; Thermochemical Tables, 3rd ed, J. of Phys. Chem. Ref. Data, 14, (1) (1985).Google Scholar
6- Dittmer, G., Niemann, U., Philips J. Res., 36, 87–111 (1981).Google Scholar
7- Blanquet, E., Thomas, N. and , coll., Proceedings of the XI Int. Conf. and CVD, Spear, K.E. and Cullen, G.W. ed., Electrochemical Soc., Pennington, NJ, p.474–481.(1990)Google Scholar