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Study of Silicon Surface Roughness by Atomic Force Microscopy

Published online by Cambridge University Press:  22 February 2011

Andrew G. Gilicinski ,
Rebecca M. Rynders ,
Scotjt E. Beck ,
Yale E. Strausser ,
James R. Stets ,
Brian S. Felker  and
David A. Bohling
Andrew G. Gilicinski
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
Rebecca M. Rynders
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
Scotjt E. Beck
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
Yale E. Strausser
Affiliation:
Digital Instruments, Inc., 520 E. Montecito Street, Santa Barbara, CA 93103
James R. Stets
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
Brian S. Felker
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
David A. Bohling
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
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Abstract

Progress is reported in developing reliable methodology for imaging silicon surfaces with the atomic force microscope (AFM). A new form of AFM, known as tapping mode AFM, has been found to provide the best quality data for surface roughness determinations. Commercially available colloidal gold spheres have been used to fabricate tip characterization standards and are used to report tip size with roughness data. Power spectral density calculations are shown to provide a useful roughness calculation based on lateral wavelength.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 324: Symposium K – Diagnostic Techniques for Semiconductor Materials Processing , 1993 , 391
Copyright
Copyright © Materials Research Society 1994

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