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Optical Properties Of Tantalum Oxide Films Deposited On BK7 Substrates By Excimer Laser Ablation

Published online by Cambridge University Press:  10 February 2011

S. Boughaba  and
M. U. Islam
S. Boughaba
Affiliation:
National Research Council Canada, Integrated Manufacturing Technologies Institute, 800 Collip Circle, London, Ontario Canada N6G 4X8
M. U. Islam
Affiliation:
National Research Council Canada, Integrated Manufacturing Technologies Institute, 800 Collip Circle, London, Ontario Canada N6G 4X8
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Abstract

Thin amorphous films of tantalum oxide were grown on borosilicate crown glass substrates by KrF excimer pulsed laser ablation of a Ta2O5 target, in an oxygen environment. The deposition was performed at a temperature of 250 or 400 °C, while the oxygen pressure was set in the range 5 to 30 mTorr. The optical properties of the tantalum oxide coatings, as evaluated by reflectance/transmittance spectrophotometry, were found to be dependent on the oxygen gas pressure. At a pressure of 5 mTorr, absorbing films were obtained, with extinction coefficients above 10−2 (at λ=633 nm), along with an optical energy band-gap as low as 0.7 eV. At a pressure of 10 mTorr and above, the coatings had refractive indices up to 2.25 (at λ=633 nm), extinction coefficients below 10−4 (for λ>390 nm), and an optical energy band-gap in the range 3.9 to 4.0 eV.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 617: Symposium J – Laser-Solid Interactionsfor Materials Processing , 2000 , J3.7
Copyright
Copyright © Materials Research Society 2000

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