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Indium Gallium Arsenide Based Non-Volatile Memory Devices with Site-Specific Self-Assembled Germanium Quantum Dot Gate

Published online by Cambridge University Press:  01 February 2011

Pik-Yiu Chan
Affiliation:
[email protected], University of Connecticut, Electrical and Computer Engineering, Storrs, Connecticut, United States
Mukesh Gogna
Affiliation:
[email protected], University of Connecticut, Electrial & Computer Engineering, Storrs, Connecticut, United States
Ernesto Suarez
Affiliation:
[email protected], University of Connecticut, Electrical and Computer Engineering, Storrs, Connecticut, United States
Fuad Alamoody
Affiliation:
[email protected], University of Connecticut, Electrial & Computer Engineering, Storrs, Connecticut, United States
Supriya Karmakar
Affiliation:
[email protected], University of Connecticut, Electrical and Computer Engineering, Storrs, Connecticut, United States
Barry Miller
Affiliation:
[email protected], University of Connecticut, Electrical and Computer Engineering, Storrs, Connecticut, United States
John Ayers
Affiliation:
[email protected], University of Connecticut, Electrical and Computer Engineering, Storrs, Connecticut, United States
Faquir Jain
Affiliation:
[email protected], University of Connecticut, Electrial & Computer Engineering, Storrs, Connecticut, United States
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Abstract

This paper presents the implementation of indium gallium arsenide field-effect transistors (InGaAs FETs) as non-volatile memory using lattice-matched II-VI gate insulator and quantum dots of GeOx-cladded Ge as the floating gate. Studies have been done to show the ability of II-VI materials to act as a tunneling gate material for InGaAs based FETs, and GeOx-cladded Ge quantum dots having the ability to store charges in the floating gate of a memory device. Proposed structure of the InGaAs device is presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

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References

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