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Published online by Cambridge University Press: 01 February 2011
Selective synthesis of silica nanowires on silicon wafers catalyzed by Pd ion implantation is reported.Nanoclusters of palladium silicide acts as seeds for nucleation of wires following a Vapor-Liquid-Solid (VLS) growth model. The consumption of silicide towards nanowire growth is confirmed through Rutherford Backscattering Spectrometry (RBS).The influence of growth time, implantation dose and heating temperature on the structure and morphology of the wires is investigated. Optimization of the these tunable parameters would be needed to facilitate controlled and directed bottom-up growth of silica nanowires.Such selective synthesis may enable a large number of applications in wide areas of future technologies such as localization of light, low dimensional waveguides for functional microphotonics, scanning near field optical microscopy (SNOM), optical interconnects, sacrificial templates, optical transmission antennae and biosensors.