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Gravure contact printing of flexible, high-performance polymer light emitting diodes for large-area displays and lighting

Published online by Cambridge University Press:  19 July 2011

Alasdair J. Campbell ,
Dae-Young Chung ,
Jingsong Huang ,
Dong-Seok Leem  and
Donal D. C. Bradley
Alasdair J. Campbell*
Affiliation:
Department of Physics and the Centre of Plastic Electronics, Blackett Laboratory, Imperial College London, South Kensington campus, London, SW7 2AZ, United Kingdom
Dae-Young Chung
Affiliation:
Department of Physics and the Centre of Plastic Electronics, Blackett Laboratory, Imperial College London, South Kensington campus, London, SW7 2AZ, United Kingdom
Jingsong Huang
Affiliation:
Molecular Vision Ltd., Imperial College BioIncubator Unit, Bessemer Building (RSM) Level 1, London, SW7 2BP, United Kingdom
Dong-Seok Leem
Affiliation:
Department of Physics and the Centre of Plastic Electronics, Blackett Laboratory, Imperial College London, South Kensington campus, London, SW7 2AZ, United Kingdom
Donal D. C. Bradley
Affiliation:
Department of Physics and the Centre of Plastic Electronics, Blackett Laboratory, Imperial College London, South Kensington campus, London, SW7 2AZ, United Kingdom
*
*Electronic mail: [email protected]
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Abstract

Gravure contact printing is the highest volume, large area printing technique known. It is ideally suited for the fabrication of large-area polymer light emitting diode (PLED) based lighting, backlights and displays. Here we show how gravure can be used to fabricate the poly (3,4-ethylene dioxythiophene) : poly(styrene sulfonate) hole injection layer and the light emitting polymer emissive layer in a conventional PLED, as well as the cesium carbonate electron injection layer in an inverted PLED. The performance equals or exceeds that of devices where these layers are deposited by conventional spin-coating.

Keywords

devicesdisplayluminescence
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1340: Symposium T – High-Speed and Large-Area Printing of Micro/Nanostructures and Devices , 2011 , mrss11-1340-t02-10
Copyright
Copyright © Materials Research Society 2010

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Footnotes

3

Current address: Frontier Research Lab, Samsung Advanced Institute of Technology, Samsung Electronics, Gyeonggi-Do, 446-712, South Korea

4

Current address: Solar Press, 2 Royal College Street, London, NW1 0NH, United Kingdom

References

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