Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-25T05:29:03.241Z Has data issue: false hasContentIssue false
  • English
  • Français

Present status and prospect of KrF laser physics and technology–large volume excitation and UV optics

Published online by Cambridge University Press:  09 March 2009

Ken-Ichi Ueda
Ken-Ichi Ueda
Affiliation:
Inst. for Laser Science, Univ. of Electro-Communications, Chofu, Tokyo 182, Japan
Get access Rights & Permissions [Opens in a new window]

Abstract

The physics and technology for e-beam generation, large volume excitation and the ultra-violet optics for high power KrF lasers is presented. The potential, due to the charge deposition, induces a return current in the plasma which balances the e-beam current. The local equilibrium mechanism stabilizes the large volume excitation using intense electron beams. The spatial and temporal characteristics of large aperture diodes are analyzed. Substantial progress in ultra violet optics in Japan has been achieved. The damage threshold of HR dielectric coating increases up to 11 J/cm2 by using low absorption materials.

Type
Research Article
Information
Laser and Particle Beams , Volume 7 , Issue 3 , August 1989 , pp. 375 - 382
Copyright
Copyright © Cambridge University Press 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Foltyn, S. R. et al. 1982 Proc. of Boulder Damage Symposium,Nov.,Boulder, Co.Google Scholar
Kannari, F. 1986 Appl. Phys. Lett., 45, 305.Google Scholar
Mangano, J. A. et al. 1978 Appl. Phys. Lett., 33, 487.CrossRefGoogle Scholar
Pulker, H. K. 1979 Appl. Opt., 18, 1969.CrossRefGoogle Scholar
Rainer, F. et al. 1985 Appl. Op., 24, 496.CrossRefGoogle Scholar
Richardson, M. C. et al. 1986 Phys. Rev. Lett., 56, 2048.CrossRefGoogle Scholar
Rosencwaig, A. & Willis, J. B. 1980 Appl. Phys. Lett., 36, 667.CrossRefGoogle Scholar
Rosocha, L. A. et al. 1987 Fusion Techno., 11, 497.Google Scholar
Salesky, E. T. & Kimura, W. D. 1985 IEEE J. Quantum Electron., QE-21, 1761.Google Scholar
Scarpetti, R. et al. 1987 Proc. of Ieee Pulsed Power ConferenceArlington VA.Google Scholar
Sullivan, J. A. 1987 Fusion Technol., 11, 684.CrossRefGoogle Scholar
Ueda, K. et al. 1986 Proc. of SPIE vol. 710, pp. 7.Google Scholar
Ueda, K. et al. 1987 Rev. Laser Eng., 15, 22 (in Japanese).CrossRefGoogle Scholar
Ueda, K. & Takuma, H. 1988 Short-Wavelength Lasers and Their Applications (Springer-Verlag), pp. 178.CrossRefGoogle Scholar