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The effects of using axial magnetic field in extreme ultraviolet photon sources for nanolithography – recent integrated simulation

Published online by Cambridge University Press:  07 January 2016

V. Sizyuk  and
A. Hassanein
V. Sizyuk*
Affiliation:
Center for Materials under Extreme Environment (CMUXE), School of Nuclear Engineering, Purdue University, West Lafayette, Indiana 47907, USA
A. Hassanein
Affiliation:
Center for Materials under Extreme Environment (CMUXE), School of Nuclear Engineering, Purdue University, West Lafayette, Indiana 47907, USA
*
Address correspondence and reprint requests to: Valeryi Sizyuk, Research Associate Professor, School of Nuclear Engineering, Purdue University, 400 Central Drive, West Lafayette, Indiana 47907, USA. E-mail: [email protected]
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Abstract

We developed a comprehensive model for simulating laser/target interaction in the presence of external axial magnetic fields. The model was integrated into the framework of the HEIGHTS-LPP computer simulation package and benchmarked with recent experimental results. The package was then used to study the angular distribution of extreme ultraviolet (EUV) photon output in plasmas produced in tin planar targets by a Nd:YAG laser. A moderate (0.5 T) permanent magnetic field does not affect EUV source evolution and output. More effective control of plasma plume expansion should be based on magnetic field gradients, that is, on the temporary varying magnetic fields as a magnetic pinch. Analysis of angular EUV output showed strong anisotropy of photon emissions. We found that the correct monitoring angle (i.e., at which the measured EUV flux corresponds to the averaged value after the correctly integrated angular distribution) does not depend on laser irradiance in the studied range and is equivalent to ~60°. We recommend arranging the EUV sensors accordingly in experiments with planar tin targets.

Keywords

Extreme ultravioletLaser plasmasMagnetic fieldPlasma device modeling
Type
Research Article
Information
Laser and Particle Beams , Volume 34 , Issue 1 , March 2016 , pp. 163 - 170
Copyright
Copyright © Cambridge University Press 2016 

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