Focus Issue: Atomic Layer Deposition for Emerging Thin-Film Materials and Applications
Atomic Layer Deposition for Emerging Thin-Film Materials and Applications
Introduction
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- Published online by Cambridge University Press:
- 15 April 2020, p. 655
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Invited Feature Paper - REVIEW
Atomic layer deposition for nonconventional nanomaterials and their applications
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- 27 November 2019, pp. 656-680
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Thin film encapsulation for the organic light-emitting diodes display via atomic layer deposition
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- 14 November 2019, pp. 681-700
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REVIEW
Atomic layer–deposited nanostructures and their applications in energy storage and sensing
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- 08 November 2019, pp. 701-719
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Invited Paper
Role of oligomer structures in the surface chemistry of amidinate metal complexes used for atomic layer deposition of thin films
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- 07 October 2019, pp. 720-731
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Invited Feature Paper
Multilevel memory and synaptic characteristics of a-IGZO thin-film transistor with atomic layer–deposited Al2O3/ZnO/Al2O3 stack layers
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- 25 November 2019, pp. 732-737
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Article
Conformal porous carbon coating on carbon fiber cloth/NiS2 composites by molecular layer deposition for durable supercapacitor electrodes
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- 09 December 2019, pp. 738-746
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Nanoscale Al2O3 coating to stabilize selenium cathode for sodium–selenium batteries
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- 02 December 2019, pp. 747-755
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Invited Feature Paper
Work function of doped zinc oxide films deposited by ALD
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- 08 November 2019, pp. 756-761
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REVIEW
Controllable atomic layer deposition coatings to boost the performance of LiMnxCoyNi1−x−yO2 in lithium-ion batteries: A review
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- 17 January 2020, pp. 762-774
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Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications
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- 08 November 2019, pp. 775-794
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Article
Atomic layer deposition of cubic tin–calcium sulfide alloy films
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- 22 November 2019, pp. 795-803
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Atomic layer deposition of zirconium oxide thin films
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- 08 November 2019, pp. 804-812
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Fabrication of iron carbide by plasma-enhanced atomic layer deposition
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- 08 November 2019, pp. 813-821
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NiSx@MoS2 heterostructure prepared by atomic layer deposition as high-performance hydrogen evolution reaction electrocatalysts in alkaline media
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- 08 November 2019, pp. 822-830
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Epitaxial growth of MgxCa1−xO on 4H–SiC(0001) and β-Ga2O3$\left( {\bar 201} \right)$ wide band gap semiconductors with atomic layer deposition
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- 03 January 2020, pp. 831-839
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Front Cover (OFC, IFC) and matter
JMR volume 35 issue 7 Cover and Front matter
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- 15 April 2020, pp. f1-f5
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Back Cover (OBC, IBC) and matter
JMR volume 35 issue 7 Cover and Back matter
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- Published online by Cambridge University Press:
- 15 April 2020, pp. b1-b2
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