Hostname: page-component-745bb68f8f-5r2nc Total loading time: 0 Render date: 2025-01-27T01:11:20.466Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of sputtered iridium dioxide thin films

Published online by Cambridge University Press:  31 January 2011

P. C. Liao ,
W. S. Ho ,
Y. S. Huang  and
K. K. Tiong
P. C. Liao
Affiliation:
Department of Electronic Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan, Republic of China
W. S. Ho
Affiliation:
Department of Electronic Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan, Republic of China
Y. S. Huang*
Affiliation:
Department of Electronic Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan, Republic of China
K. K. Tiong
Affiliation:
Department of Electrical Engineering, National Taiwan Ocean University, Keelung 202, Taiwan, Republic of China
*
a) Author to whom correspondence should be addressed.
Get access

Abstract

Iridium dioxide (IrO2) thin films, deposited on Si substrates by reactive rf sputtering method under various conditions, were characterized by atomic force microscopy (AFM), x-ray diffraction (XRD), electrical-conductivity, spectrophotometry, ellipsometry and Raman scattering measurements. The average grain sizes of the films were estimated by AFM. A grain boundary scattering model was used to fit the relation between the average grain size and electrical resistivity. The optical and dielectric constants were determined by the ellipsometry measurements. The results of the electrical and optical studies show a metallic character of the films deposited at higher temperatures. The results of XRD and Raman scattering indicate that the IrO2 films deposited at temperatures higher than 300 °C show the presence of (200) texture.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 5 , May 1998 , pp. 1318 - 1326
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Vest, R. W. and Honig, J. M., Ceram. Glass: Sci. Technol. 4, 343 (1974).Google Scholar
2.Ryden, W. D., Lawson, A. W., and Sartain, C. C., Phys. Rev. B 1, 1494 (1970).Google Scholar
3.Gottesfeld, S. and Srinivasan, S., J. Electroanal. Chem. 86, 89 (1978).Google Scholar
4.Rolewicz, J., Comninellis, C., Plattner, E., and Hinden, J., Electrochim. Acta. 33, 573 (1988).Google Scholar
5.Mozota, J. and Conway, B. E., J. Electrochem. Soc. 128, 2142 (1981).Google Scholar
6.Hackwood, S., Schiavone, L. M., Dautremon-Smith, W. C., and Beni, G., J. Electrochem. Soc. 128, 2569 (1981).Google Scholar
7.Dautremon-Smith, W. C., Displays 3, 67 (1982).Google Scholar
8.Gottesfeld, S. and McIntyre, J. D. E., J. Electrochem. Soc. 126, 742 (1979).CrossRefGoogle Scholar
9.Katsube, T., Lauks, I., and Zemel, J. N., Sensors and Actuators 2, 399 (1982).Google Scholar
10.Burke, L. D., Mulcahy, J. K., and Whelan, D. P., J. Electroanal. Chem. 163, 117 (1984).Google Scholar
11.Hitchman, M. L. and Ramanathan, S., Anal. Chem. Acta. 263, 53 (1992).Google Scholar
12.Pasztor, K., Sekiguchi, A., Shimo, N., Kitamura, N., and Masuhara, H., Sensors and Actuators B 12, 225 (1993).Google Scholar
13.Robblee, L. S., Lefko, J. L., and Brummer, S. B., J. Electrochem. Soc. 130, 731 (1983).Google Scholar
14.Beebe, X. and Rose, T. L., IEEE Trans. Biomed. Eng. 35, 494 (1988).Google Scholar
15.Nakamura, T., Nakao, Y., Kamisawa, A., and Takasu, H., Appl. Phys. Lett. 65, 1522 (1994).Google Scholar
16.Nakamura, T., Nakao, Y., Kamisawa, A., and Takasu, H., J. Appl. Phys. 33, 5207 (1994).Google Scholar
17.Kreider, K., J. Vac. Sci. Technol. A 4, 606 (1986).Google Scholar
18.Hackwood, S., Dayem, A. H., and Beni, G., Phys. Rev. B 26, 471 (1982).Google Scholar
19.Krusin-Elbaum, L., Thin Solid Films 169, 17 (1989).Google Scholar
20.Woollam, J. A. and Snyder, P. G., Mater. Sci. Eng. B 5, 279 (1990).Google Scholar
21.Mayadas, A. F. and Shatzkes, M., Phys. Rev. B 15, 1382 (1970).Google Scholar
22.Goel, A. K., Skorinko, G., and Pollak, F. H., Phys. Rev. B 24, 7342 (1981).Google Scholar
23.Wooten, F., Optical Properties of Solids (Academic, New York, 1972), p. 62.Google Scholar
24.Xu, J. H., Jarlborg, T., and Freeman, A. J., Phys. Rev. B 40, 7939 (1989).Google Scholar
25.Huang, Y. S., Lin, S. S., Huang, C. R., and Lee, M. C., Solid State Commun. 70, 517 (1989).Google Scholar