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Characterization of nanocrystalline Ti films deposited by DC magnetron sputtering onto FTO glass substrate

Published online by Cambridge University Press:  26 August 2015

Motahareh Einollahzadeh-Samadi ,
Reza Sabet Dariani  and
Mehdi Abdi
Motahareh Einollahzadeh-Samadi
Affiliation:
Department of Physics, Alzahra University, Tehran 1993893973, Iran
Reza Sabet Dariani*
Affiliation:
Department of Physics, Alzahra University, Tehran 1993893973, Iran
Mehdi Abdi
Affiliation:
Physik Department, Technische Universität München, 85748 Garching, Germany
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Titanium (Ti) thin films were deposited by DC magnetron sputtering at conventional conditions with different substrate temperature, deposition rate, and inert gas pressure. The compositional, structural, morphological, and optical properties of the Ti films were investigated. It is shown that the films were crystalline with α-Ti phase and hcp structure only. The crystallinity increased with increase in substrate and deposition rate. Analysis of the atomic force microscopy images shows that the films were uniform, crack free, and adhered well to the substrate. It is found that, a strong relation existed between the structural and optical properties of the films. The optical properties of the Ti films were most influenced under the deposition conditions. From this dependence, the optimum deposition conditions are obtained to prepare metallic, crystalline, and dense Ti films with smooth surface under conventional conditions.

Keywords

titaniumDC magnetron sputteringoptical propertiessubstrate temperaturedeposition rateinert gas pressure
Type
Articles
Information
Journal of Materials Research , Volume 30 , Issue 20 , 28 October 2015 , pp. 3093 - 3103
Copyright
Copyright © Materials Research Society 2015 

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