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Determination of Ultra-Thin Carbon Coating Thickness by X-ray Fluorescence Technique

Published online by Cambridge University Press:  06 March 2019

R. L. White  and
T. C. Huang
R. L. White
Affiliation:
IBM General Products Division San Jose, CA 95193
T. C. Huang
Affiliation:
IBM Research Division Alma den Research Center San Jose, CA 95120
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Abstract

A tcchniquc for high-precision measurement of carbon thin-film thickness using X-ray fluorescence (XRF) is described. A quadratic calibration procedure is used for carbon thin films on silicon. Measurement of carbon-film thickness in a double-layer structure of carbon and CoCrX alloy is complicated by interference effects from the underlying layer. The dependence of the relative precision in measuring thickness (σT/T) on the counting time has been derived. It shows that a precision of 2% for a 25-nm carbon coating can be obtained using a W/C crystal and counting time of 4 minutes. Intensity and resolution advantages provided by the recently developed Ni/C and V/C multilayer synthetic crystals are also described.

Type
VI. Analysis of Thin Films by XRD and XRF
Information
Advances in X-Ray Analysis , Volume 32: Thirty-Seventh Annual Conference on Applications of X-ray Analysis, August 1-5, 1988 , 1988 , pp. 331 - 339
Copyright
Copyright © International Centre for Diffraction Data 1988

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References

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