Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-02T20:23:15.587Z Has data issue: false hasContentIssue false

Sterilization of dental bacteria in a N2-O2 microwaves post-discharge, at low pressure: influence of temperature

Published online by Cambridge University Press:  11 May 2004

S. Villeger*
Affiliation:
CPAT, University Paul Sabatier, 118 route de Narbonne, 31062 Toulouse, France
A. Ricard
Affiliation:
CPAT, University Paul Sabatier, 118 route de Narbonne, 31062 Toulouse, France
M. Sixou
Affiliation:
GREMI, University Paul Sabatier, 118 route de Narbonne, 31062 Toulouse, France
Get access

Abstract

Recently, plasmas have been largely studied to develop a new cold and safe sterilization process. The plasma efficiency on bacteria destruction has been proved at low or near atmospheric pressure. In our investigation we used a N2-O2 post discharge at low pressure, where the experimental conditions allowing the optimal production of active species have been determined: 100 Watt, 1 Ln.min−1, 5 Torr. By exposing E. coli to these plasma conditions, it is demonstrated a synergy of N and O active atoms on substrate temperature: a reduction of 6 log was achieved after a treatment time of 20 minutes at 80 °C and of 12 log after 5 minutes at 120 °C.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Steelman, V.M., Ethylene oxide: the importance of aeration, AORN J. 55, 773 (1992) CrossRef
Moisan, M., Barbeau, J., Moreau, S., Pelletier, J., Tabrizan, M., L'H. Yahia, Int. J. Pharm. 226, 1 (2001) CrossRef
Laroussi, M., IEEE Trans. Plasma Sci. 30, 1409 (2002) CrossRef
Ben Gadri, R., Reece Roth, J., Montie, T.C., Kelly-Winteberg, K., Tsai, P.P.-Y., Helfritch, D.J., Feldman, P., Sherman, D.M., Fuat Karakaya, Zhiyu Chen, Surf. Coat. Technol. 131, 528 (2000)
Ricard, A., J. Phys. D: Appl. Phys. 30, 2261 (1997) CrossRef
Moreau, S., Moisan, M., Tabrizian, M., Barbeau, J., Pelletier, J. et al., J. Appl. Phys. 88, 1166 (2000) CrossRef
Ricard, A., Moisan, M., Moreau, S., J. Phys. D: Appl. Phys. 34, 1203 (2001) CrossRef
Villeger, S., Cousty, S., Ricard, A., Sixou, M., J. Phys. D: Appl. Phys. 36, L1 (2003)
L. Hochard, ESCAMPIG 18 E (1994) 336
Ricard, A., Nouvellon, C., Konstantinidis, S., Dauchot, J.P., Wautelet, M., Hecq, M., J. Vac. Sci. Technol. A 20, 1488 (2002) CrossRef
Gordiets, B., Ferreira, C.M., Nohorny, J., Pagnon, D., Touzeau, M., Vialle, M., J. Phys. D 29, 1021 (1996) CrossRef
Vorob'ev, V.P., Kovtun, V.V., Kudryavtsev, N.N., Kin. Catal. 30, 1155 (1989)
Adams, S.F., Miller, T.A., Plasma Source Sci. Technol. 9, 248 (2000) CrossRef
J.C. Greaves, J.W. Linnet, Trans. Faraday Soc. 35, 1323; 1346 (1959)