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Study of a chemical-vapor-deposited diamond thin film on a molybdenum substrate by glancing incidence X-ray diffraction

Published online by Cambridge University Press:  01 March 2012

Jianfeng Fang ,
Jing Huo ,
Jinyuan Zhang  and
Yi Zheng
Jianfeng Fang
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
Jing Huo
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
Jinyuan Zhang
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
Yi Zheng
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
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Abstract

The structure of a chemical-vapor-deposited (CVD) diamond thin film on a Mo substrate was studied using quasi-parallel X-ray and glancing incidence techniques. Conventional X-ray diffraction analysis revealed that the sample consists of a diamond thin film, a Mo2C transition layer, and Mo substrate. The Mo2C transition layer was formed by a chemical reaction between the diamond film and the Mo substrate during the CVD process. A method for layer-thickness determination of the thin film and the transition layer was developed. This method was based on a relationship between X-ray diffraction intensities from the transition layer or its substrate and a function of grazing incidence angles. Results of glancing incidence X-ray diffraction analysis showed that thicknesses of the diamond thin film and the Mo2C transition layer were determined successfully with high precision.

Keywords

glancing incidence X-ray diffractiondiamond thin filmthickness determination
Type
Representative Papers from the Chinese XRD 2006 Conference
Information
Powder Diffraction , Volume 22 , Issue 4 , December 2007 , pp. 319 - 323
Copyright
Copyright © Cambridge University Press 2007

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