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Study of a chemical-vapor-deposited diamond thin film on a molybdenum substrate by glancing incidence X-ray diffraction

Published online by Cambridge University Press:  01 March 2012

Jianfeng Fang
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
Jing Huo
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
Jinyuan Zhang
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China
Yi Zheng
Affiliation:
Department of Powder Metallurgy, Central Iron and Steel Research Institute, Beijing, 100081, China

Abstract

The structure of a chemical-vapor-deposited (CVD) diamond thin film on a Mo substrate was studied using quasi-parallel X-ray and glancing incidence techniques. Conventional X-ray diffraction analysis revealed that the sample consists of a diamond thin film, a Mo2C transition layer, and Mo substrate. The Mo2C transition layer was formed by a chemical reaction between the diamond film and the Mo substrate during the CVD process. A method for layer-thickness determination of the thin film and the transition layer was developed. This method was based on a relationship between X-ray diffraction intensities from the transition layer or its substrate and a function of grazing incidence angles. Results of glancing incidence X-ray diffraction analysis showed that thicknesses of the diamond thin film and the Mo2C transition layer were determined successfully with high precision.

Type
Representative Papers from the Chinese XRD 2006 Conference
Copyright
Copyright © Cambridge University Press 2007

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