Hostname: page-component-586b7cd67f-dsjbd Total loading time: 0 Render date: 2024-11-24T10:32:36.538Z Has data issue: false hasContentIssue false
  • English
  • Français

Quick X-ray reflectivity of spherical samples

Published online by Cambridge University Press:  16 April 2013

Krassimir Stoev  and
Kenji Sakurai
Krassimir Stoev*
Affiliation:
AECL – Chalk River Laboratories, Chalk River, Ontario, Canada
Kenji Sakurai
Affiliation:
University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki, Japan National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki, Japan
*
a)Author to whom correspondence should be addressed. Electronic mail: [email protected]
Get access Rights & Permissions [Opens in a new window]

Abstract

Recently, a new experimental setup for quick X-ray reflectivity (q-XRR) measurements was proposed, which is based on simultaneous recording of an X-ray reflectivity curve over all angles of interest. This new setup for q-XRR allows measurements to be done within seconds, thus permitting studies of the time evolution of chemical, thermal, and mechanical changes at the surfaces and interfaces of different materials. Since the q-XRR measurement setup utilizes an extended X-ray source and detector, it is important to develop models and to account for the following two effects: (i) diffuse scattering associated with different points of the source and (ii) sample curvature. Models accounting for both effects are presented, and their influences on interpretation of the q-XRR measurement results are discussed.

Keywords

X-ray reflectivitydiffuse scatteringsample curvature
Type
Technical Articles
Information
Powder Diffraction , Volume 28 , Issue 2 , June 2013 , pp. 105 - 111
Copyright
Copyright © International Centre for Diffraction Data 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Albouy, P. and Valerio, P. (1997). “A motionless X-ray reflectometer for air/liquid interface based on Naudon's design: example of application”, Supromol. Sci. 4, 191–194.CrossRefGoogle Scholar
Bridou, F. (1994). “Curvature effect in grazing X-ray reflectometry”, J. Phys. III France 4, 1513–1522.Google Scholar
Chihab, J. and Naudon, A. (1992). “Possibilites de mesure quantitative avec un appareilage de reflectometrie X utilisant le mode angulaire dispersive,” J. Phys. III (France), 2, 2291–2300.CrossRefGoogle Scholar
Koppel, L. N. (1997). “X-ray thickness gauge”, US Patent No. 5619548.Google Scholar
Mizusawa, M., Stoev, K., and Sakurai, K. (2003). “Analysis of surface X-ray scattering from synthetic quartz mirror”, 2002 Photon Factory Activity Report Part B, 20, 64.Google Scholar
Naudon, A. (1992). “Mode mini pour la reflectrometrie,”Analusis (France), 18, I22.Google Scholar
Naudon, A., Chihab, J., Goudeau, P., and Mimault, J. (1989). “New apparatus for grazing X-ray reflectometry in the angle-resolved dispersive mode,” J. Appl. Cryst., 22, 460–464.CrossRefGoogle Scholar
Niggemeier, U., Lischka, K., Plotz, W. M., and Holy, V. (1997). “X-ray Reflectometer for the Diagnostics of Thin Films During Growth,” J. Appl. Cryst., 30, 905–908.CrossRefGoogle Scholar
Sakurai, K. and Mizusawa, M. (2007). Japanese Patent No. 3903184.Google Scholar
Sakurai, K., Mizusawa, M., and Ishii, M. (2007a). “Recent Novel X-ray Reflectivity Techniques: Moving Towards Quicker Measurement to Observe Changes at Surface and Buried Interfaces,” Trans. MRS Japan, 32, 181–186.Google Scholar
Sakurai, K., Mizusawa, M., Ishii, M., Kobayashi and Imai, S. (2007b). “Instrumentation for X-ray reflectivity in micro area: present status and future outlook”, J. Phys., Conf. Ser. U.K., 83, 012001.CrossRefGoogle Scholar
Stepanov, S. (2012). “TRDS On-Line Calculation Tool for X-ray Diffuse Scattering”, available online at http://sergey.gmca.aps.anl.gov/TRDS_sl.htmlGoogle Scholar
Stoev, K., Knoth, J., and Schwenke, H. (1997). “X-ray reflectivity simulation software,” in 7th German–Japanese Workshop on Chemical Information, April 10–12, 1997, Nara, Japan (http://inaba.nims.go.jp/G-J/report/stoev.html).Google Scholar
Stoev, K., Samson, V., Mizusawa, M., and Sakurai, K. (2009). “Calculation of diffuse scattering in quick X-ray reflectometry”, in 45 Annual Conference on X-ray Chemical Analysis, November 5–6, 2009, Osaka, Japan.Google Scholar
Stoev, K. and Sakurai, K. (2011). “Aberration effects in quick X-ray reflectivity of curved samples”, IOP Conf. Ser.: Mater. Sci. Eng. 24, 012014.CrossRefGoogle Scholar