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Volatile Liquid Precursors for the Chemical Vapor Deposition (CVD) of Thin Films Containing Alkali Metals

Published online by Cambridge University Press:  10 February 2011

Randy N. R. Broomhall-Dillard
Affiliation:
Harvard University Chemical Laboratories, Cambridge, MA 02138
Roy G. Gordon
Affiliation:
Harvard University Chemical Laboratories, Cambridge, MA 02138
Valerie A. Wagner
Affiliation:
Harvard University Chemical Laboratories, Cambridge, MA 02138
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Abstract

The first volatile, liquid compounds of alkali metals were synthesized and used for the CVD of materials containing alkali metals. Amides of the type MNR1(SiMe2R2) and MN(SiMe2R2)2 [M = Li, Na, K; R1 = t-butyl, t-amyl; R2= ethyl, n-propyl, i-propyl, n-butyl, i-butyl, n-hexyl, n-octyl] were made and characterized. The lithium amides were prepared via the deprotonation of the parent amine using butyl lithium. The sodium and potassium amides were formed by transamination of sodium amide and potassium bis(trimethylsilyl)amide with the parent amines. For example, lithium bis(ethyldimethylsilyl)amide was prepared from butyl lithium and bis(ethyldimethylsilyl)amine and was distilled as a clear, colorless liquid at 122 °C (0.2 Torr) having a viscosity of 37 cP at 40 °C. These alkali metal amides can be used as convenient liquid sources for CVD of mixed metal oxides containing alkali metals, such as the non-linear optical material lithium niobate, lithium-containing materials for battery electrodes, electrochromic tungsten bronzes, and the pyroelectric and ferroelectric material potassium tantalate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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