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Thin Films of Ferroelectrics Made by Pulsed Laser Deposition for Optoelectronic Applications

Published online by Cambridge University Press:  15 February 2011

D.B. Chrisey
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
L.A. Knauss
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345 NRL/NRC Postdoctoral Research Associate
J.S. Horwitz
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
R.C.Y. Auyeung
Affiliation:
SFA Inc., Landover, MD 20785
D. Knies
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345 NRL/ASEE Postdoctoral Research Associate
K.S. Grabowski
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
E.P. Donovan
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
K. Mccallion
Affiliation:
University of Strathclyde, Glasgow, United Kingdom
W. Johnstone
Affiliation:
University of Strathclyde, Glasgow, United Kingdom
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Abstract

We have deposited ferroelectric thin films by pulsed laser deposition to be used as an inline optoelectronic modulator utilizing evanescent field coupling to a side-polished optical fiber. In order to satisfy waveguiding conditions, amorphous quartz substrates (n= 1.447) were necessary. Ferroelectric films of (Pb0.91La0.90)(Zr0.65,Ti0.35)O3, Pb0.80La0.20TiO3 (PLZT), and Sr0.5Ba0.5TiO3 were deposited on quartz substrates and thin Bi4Ti3O12 buffer layers were explored as a chemical barrier and to improve crystallographic texturing. The morphology of thick films (˜3 µm) of PLZT was not acceptable for optical applications, whereas the Sr0.5Ba0.5TiO3 films were very smooth, but had some cracking. The Sr0.5Ba0.5TiO3 films were optically determined to be uniform and of sufficient quality for use in fabricating in-line fiber optic modulators.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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