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Thin Film Silicon Microbridges for DNA Detection

Published online by Cambridge University Press:  01 February 2011

T. Adrega
Affiliation:
INESC Microsistemas e Nanotecnologias (INESC MN), Lisbon, Portugal
J. Gaspar
Affiliation:
INESC Microsistemas e Nanotecnologias (INESC MN), Lisbon, Portugal
F. Fixe
Affiliation:
INESC Microsistemas e Nanotecnologias (INESC MN), Lisbon, Portugal Center of Biological & Chemical Engineering, Instituto Superior Técnico, Lisbon, Portugal
V. Chu
Affiliation:
INESC Microsistemas e Nanotecnologias (INESC MN), Lisbon, Portugal
D.M.F. Prazeres
Affiliation:
Center of Biological & Chemical Engineering, Instituto Superior Técnico, Lisbon, Portugal Department of Chemical Engineering, Instituto Superior Técnico, Lisbon, Portugal
J.P. Conde
Affiliation:
INESC Microsistemas e Nanotecnologias (INESC MN), Lisbon, Portugal Department of Chemical Engineering, Instituto Superior Técnico, Lisbon, Portugal
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Abstract

Thin-film MEMS molecular sensors are fabricated at temperatures below 110°C on glass substrates. The microelectromechanical structure consists of a surface micromachined bilayer bridge of phosphorous-doped hydrogenated amorphous silicon and aluminum with a patterned SiO2 layer on the top. Specific binding of DNA to functionalized SiO2 on the bridge is confirmed using fluorescence microscopy. Microbridges are electrostatically actuated and the resonance frequency measurements are performed in vacuum in the initial state after fabrication, after the chemical functionalization of the SiO2surface and after DNA immobilization. The sensor is able to detect the functionalization molecular layer, the cross-linker molecular layer, and the DNA molecules attached to the surface through a shift in its resonance frequency. The binding of molecules to the surface results in a shift of the resonance frequency due to contributions from surface stresses and mass loading.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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