Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-12-02T21:56:34.985Z Has data issue: false hasContentIssue false
  • English
  • Français

Thermal Plasma Chemical Vapor Deposition of Superhard Nanostructured Si-C-N Coatings

Published online by Cambridge University Press:  01 February 2011

Nicole J. Wagner ,
Megan J. Cordill ,
Lenka Zajickova ,
William W. Gerberich  and
Joachim V. R. Heberlein
Nicole J. Wagner
Affiliation:
Mechanical Engineering, University of Minnesota Minneapolis, MN 55455, USA
Megan J. Cordill
Affiliation:
Chemical Engineering and Materials Science, University of Minnesota Minneapolis, MN 55455, USA
Lenka Zajickova
Affiliation:
Mechanical Engineering, University of Minnesota Minneapolis, MN 55455, USA
William W. Gerberich
Affiliation:
Chemical Engineering and Materials Science, University of Minnesota Minneapolis, MN 55455, USA
Joachim V. R. Heberlein
Affiliation:
Mechanical Engineering, University of Minnesota Minneapolis, MN 55455, USA
Get access

Abstract

A triple torch plasma reactor was used to synthesize Si—C—N composite films via the thermal plasma chemical vapor deposition process. The argon-nitrogen plasma provided atomic nitrogen to carbon- and silicon-based reactants, which were injected through a central injection probe and ring configuration. Films were deposited with variations of the total nitrogen flow through the torches (1.5-4.5slm), reactant mixture (silicon tetrachloride and acetylene or hexamethyldisilazane) and substrate material (silicon and molybdenum). Micro X-ray diffraction was used to determine that both α-Si3N4 and β-Si3N4 were dominant in most of the depositions. Composites of silicon nitride and silicon carbide were synthesized on molybdenum. The bonding of amorphous phases was investigated using Fourier transform infrared spectroscopy, which indicated the presence of N—H, CHx and CΞ in various films. Indentation tests on the polished film cross-sections determined that large variations in hardness and elastic modulus existed for minor changes in film composition. Correlations between indentation results and scanning electron and optical microscope images showed that the mechanical properties greatly depend on the film morphology; the denser, smoother, and more crystalline films tended to display enhanced mechanical properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 880: Symposium BB – Mechanical Properties of Nanostructured Materials-Experiments and Modeling , 2005 , BB2.10/O3.10
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Lange, F. F., J. Am. Ceram. Soc. 56 445–450 (1973).Google Scholar
[2] Badzian, A., J. Am. Ceram. Soc. 85 16–20 (2002).Google Scholar
[3] Veprek, S., J. Vac. Sci. Technol. A 17 (5) 2401–2420 (1999).Google Scholar
[4] Riedel, R., Seker, M. and Becker, G., J. Eur. Ceram. Soc. 5 113–122 (1989).Google Scholar
[5] Pezzotti, G. and Sakai, M., J. Am. Ceram. Soc. 77 (11) 3039–3041 (1994).Google Scholar
[6] Poorteman, M., Descamps, P., Cambier, F., Plisnier, M., Canonne, V. and Descamps, J. C., J. Eur. Ceram. Soc. 23 2361–2366 (2003).Google Scholar
[7] Oliver, W. C. and Pharr, G. M., J. Mater. Res. 7 (6) 1564–1583 (1992).Google Scholar
[8] Benitez, F. and Esteve, J., Soc. Vac. Coat. 505 280–285 (2002).Google Scholar
[9] Bruice, B. Y., “Organic Chemistry,” Prentice Hall, NJ (1995) p.541.Google Scholar
[10] X-ray powder diffraction file #01-071-0570.Google Scholar
[11] X-ray powder diffraction file #01-082-0697.Google Scholar
[12] Walters, J. K., Kühn, M., Spaeth, C., Dooryhee, E. and Newport, R. J., J. Appl. Phys. 83 3529–3534 (1998).Google Scholar
[13] Jedrzejowski, P., Cizek, J., Amassian, A, Klemberg-Sapieha, J. E., Vlcek, J. and Martinu, L., Soc. Vac. Coat. 505 530–534 (2003).Google Scholar