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Temperature Behavior of Pt/Au Ohmic Contacts to p-GaN

Published online by Cambridge University Press:  10 February 2011

D. J. King
Affiliation:
University of New Mexico, Center for High Technology Materials, Albuquerque, NM
L. Zhang
Affiliation:
University of New Mexico, Center for High Technology Materials, Albuquerque, NM
J. C. Ramer
Affiliation:
University of New Mexico, Center for High Technology Materials, Albuquerque, NM
S. D. Hersee
Affiliation:
University of New Mexico, Center for High Technology Materials, Albuquerque, NM
L. F. Lester
Affiliation:
University of New Mexico, Center for High Technology Materials, Albuquerque, NM
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Abstract

Ohmic contacts to Mg-doped p-GaN grown by MOCVD [1] are studied using a circular transmission line model (TLM) to avoid the need for isolation. For samples which use a p-dopant activation anneal before metallization, no appreciable difference in the specific contact resistance, rc, as a function of different capping options is observed. However, a lower rc is obtained when no pre-metallization anneal is employed, and the post-metallization anneal simultaneously activates the p-dopant and anneals the contact. This trend is shown for Pt/Au, Pt, Pd/Pt/Au, and Ni/Au contacts to p-GaN. The rc 's for these metal contacts are in the range of 1.4–7.6 × 10-3 ohm-cm2 at room temperature at a bias of 10mA. No particular metallization formula clearly yields a consistently superior contact. Instead, the temperature of the contact has the strongest influence.

Detailed studies of the electrical properties of the Pt/Au contacts reveal that the I-V linearity improves significantly with increasing temperature. At room temperature, a slightly rectified I-V characteristic curve is obtained, while at 200°C and above, the I-V curve is linear. For all the p-GaN samples, it is also found that the sheet resistance decreases by an order of magnitude with increasing temperature from 25°C to 350°C. The specific contact resistance is also found to decrease by nearly an order of magnitude for a temperature increase of the same range. A minimum rc of 4.2 × 10-4 ohm-cm2 was obtained at a temperature of 350°C for a Pt/Au contact. This result is the lowest reported rc for ohmic contacts to p-GaN.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Hersee, S. D., Ramer, J., Zheng, K., Kranenberg, C., Malloy, K., Banas, M., and Goorsky, M., J. Electron. Mat. 24, 1519 (1995).Google Scholar
2. Nakamura, S., Iwasa, N., Senoh, M., and Mukai, T., Jpn J. Appl. Phys. 31, 1258 (1992).Google Scholar
3. Nakamura, S., Mukai, T., and Senoh, M., Appl. Phys. Lett. 64, 1678 (1994).Google Scholar
4. Nakamura, S., Senoh, M., Nagahama, S., Naruhito, N., Yamada, T., Matsushita, T., Sugimoto, Y., and Kiyoku, H., Appl. Phys. Lett. 69, 1477 (1996).Google Scholar
5. Zhang, L., Ramer, J., Brown, J., Zheng, K., Lester, L. F., and Hersee, S. D., Appl. phys. Lett., 68 367 (1996).Google Scholar
6. Vartuli, C. B., MacKenzie, J. D., Lee, J. W., Abernathy, C. R., Pearton, S. J., and Shul, R. J., J. Appl. Phys. 80 3264 (1996).Google Scholar
7. Shul, R. J., McClellan, G. B., Casalnuovo, S. A., Rieger, D. J., Pearton, S. J., Constantine, C., Barrati, C., Karlinek, R. F., Tran, C., and Schurman, M., Appl. Phys. Lett. 69 1119 (1996).Google Scholar
8. Cohen, Simon S., Gildenblat, Gennady Sh., VLSI Electronics Microstucture Science Volume 13. edited by Einspruch, Norman G. (Academic Press, Orlando, 1986), pp. 97117.Google Scholar
9. Lester, L. F., Brown, J. M., Ramer, J. C., Zhang, L., Hersee, S. D., and Zolper, J. C., Appl. phys. Lett., 69 2737 (1996).Google Scholar
10. Pearton, S.J., Shul, R.J., Wilson, R.G., Ren, F., Zavada, J.M., Abernathy, C.R., Vartuli, C.B., Lee, J.W., Mileham, J.R., and Mackenzie, J.D., J of Electronic Materials, 25, 845 (1996).Google Scholar
11. Fast, J.D., Interaction of Metals and Gases. (MacMillan, New York, 1971) Chapter 1.Google Scholar