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Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application

Published online by Cambridge University Press:  01 February 2011

Hiroshi Yoshida ,
Hirofumi Kitano ,
Satoshi Akasaka ,
Tomohiro Inoue ,
Mikihito Taknaka ,
Hirokazu Hasegawa  and
Hideki Nagano
Hiroshi Yoshida
Affiliation:
[email protected], Hitachi Ltd., Hitachi Research Laboratory, MD#431, 7-1-1 Omika, Hitachi, Ibaraki, 319-1292, Japan, +81-294-52-7527, +81-294-52-7622
Hirofumi Kitano
Affiliation:
[email protected], Kyoto University, Department of Polymer Chemistry, Graduate School of Engineering, Nishikyo-ku, Kyoto, 615-8510, Japan
Satoshi Akasaka
Affiliation:
[email protected], Kyoto University, Department of Polymer Chemistry, Graduate School of Engineering, Nishikyo-ku, Kyoto, 615-8510, Japan
Tomohiro Inoue
Affiliation:
[email protected], Kyoto University, Department of Polymer Chemistry, Graduate School of Engineering, Nishikyo-ku, Kyoto, 615-8510, Japan
Mikihito Taknaka
Affiliation:
[email protected], Kyoto University, Department of Polymer Chemistry, Graduate School of Engineering, Nishikyo-ku, Kyoto, 615-8510, Japan
Hirokazu Hasegawa
Affiliation:
[email protected], Kyoto University, Department of Polymer Chemistry, Graduate School of Engineering, Nishikyo-ku, Kyoto, 615-8510, Japan
Hideki Nagano
Affiliation:
[email protected], Hitachi Maxell Ltd, Development & Technology Center, Tsukubamirai, Ibaraki, 300-2496, Japan
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Abstract

Block copolymer lithography is a promising method for fabricating periodical nano patterns less than 20nm by self-assembly and can be applicable for fabricating patterned magnetic media with recording density over 1Tbit/inch2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Only by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the constituent homopolymer (PS or PMMA), we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.

Keywords

lithography (removal)self-assemblynanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O17-01
Copyright
Copyright © Materials Research Society 2007

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References

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