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Synthesis and Properties of Mo/MoSix Microlaminates Using Ion Beam Assisted Deposition
Published online by Cambridge University Press: 15 February 2011
Abstract
Films of Mo, MoSix and Mo/MoSix (1.22<x<1.35) multilayers were formed by physical vapor deposition (PVD) and ion beam assisted deposition (IBAD) onto (100) Si, glass and graphite substrates. Ion to atom arrival rate (R) ratios for IBAD varied from 0.01 to 0.1 and film thicknesses varied from 200 to 1100 nm. The Si/Mo ratio decreased with increasing R ratio. The oxygen content of Mo films was greater than silicide films, but both decreased substantially with increasing R ratio. Ar incorporation increased with increasing R ratio to a maximum of 1 at% in Mo and 5 at% in MoSi1.22. Mo films exhibit a strong (110) fiber texture at low R ratios. At the highest R ratio, a tilting of the (110) fiber texture by 15° occurs, along with the development of a distinct azimuthal texture indicative of planar channeling of the ion beam along (110) planes. The microstructure of the multilayer consists of small Mo grains and an amorphous silicide. Average film stress in Mo films increases from tension to a maximum value of 0.63 GPa and becomes compressive with increasing normalized energy. The stress in the MoSix films decreases with increasing normalized energy and saturates at a compressive stress of -0.24 GPa at 25 eV/atom. Indentation fracture experiments using a Vickers indenter with a 300 g load show a fracture behavior that is consistent with a residual stress effect for the IBAD monolithic MoSix and microlaminate, but which is influenced by additional factors in the PVD microlaminate.
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- Copyright © Materials Research Society 1992
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