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Substrate Surface Effects on the Properties of Sputter-Deposited and Laser-Irradiated Films.

Published online by Cambridge University Press:  25 February 2011

A. J. Pedraza ,
M. J. Godbole  and
L. Romana
A. J. Pedraza
Affiliation:
Department of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996–2200
M. J. Godbole
Affiliation:
Department of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996–2200
L. Romana
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831–6118
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Abstract

Sapphire substrates, mechanically polished to an optical finish, were annealed for two days at either 1000°C or 1350°C. The near surface condition of as-polished and of the annealed substrates was analyzed by Rutherford backscattering/channeling (RBS-C) and by scanning electron microscopy/channeling (SEM-C), by transmission electron microscopy (TEM), and by scanning tunnelling microscopy (STM). The polished substrates were found to be RBS-amorphous up to 100 nm, and heavily damaged at larger depths. In agreement with these results, no electron channeling was obtained from polished samples. TEM, however, showed that the damaged region was crystalline, and the only defects detected were microtwins. Both RBS-C and SEM-C analyses revealed that the damage is removed when the sapphire substrates are annealed for 48 hrs. at 1350°C. The condition of the near-surface region, viz., as-polished or annealed, is found to strongly affect the morphology of the laser-irradiated copper films deposited on sapphire substrates. A correlation is found between the threshold for film evaporation and for film rupture upon laser irradiation, both being a function of the substrate condition. It is concluded that the near-surface damaged layer acts as a thermal barrier for heat transport across the substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 238: Symposium Cb – Structure and Properties of Interfaces in Materials , 1991 , 347
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1. Brown, W.L., in “Laser and Electron Beam Processing of Materials,” edited by White, C.W. and Peercy, P.S., Academic Press, New York, NY, 20 (1980)CrossRefGoogle Scholar
2. Godbole, M.J., Pedraza, A.J., and Pedraza, D.F., to be publishedGoogle Scholar
3. Godbole, M.J., Pedraza, A.J., Lowndes, D.H., and Thompson, J.R. Jr, Journal of Materials Research, in press, April, 1992 Google Scholar
4. Klemens, P.G., Nucl. Instr. & Methods B1, 204 (1984)Google Scholar
5. Godbole, M.J., Pedraza, A.J., Lowndes, D.H., and Thompson, J.R. Jr, Materials Research Society Symposium on 'Phase Formation and Modification by Beam-Solid Interactions,” Fall 1991, Boston, MA Google Scholar
6. Anthony, T.R. and Cline, H.E., J. Appl. Phys. 48, 3888 (1977)CrossRefGoogle Scholar
7. Possin, G.E., Parks, H.G., and Chiang, S.W., Mat. Res. Soc. Symp. Proc, vol. 1, 73 (1981)Google Scholar
8. Kingery, W.D., J. Amer. Ceram. Soc. 37, 18 (1954)Google Scholar