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Subpicosecond Luminescence Studies of Carrier Dynamics in Nitride Semiconductors Grown Homoepitaxially By MBE On GaN Templates

Published online by Cambridge University Press:  11 February 2011

G. A. Garrett
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
A. V. Sampath
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
C. J. Collins
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
F. Semendy
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
K. Aliberti
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
H. Shen
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
M. Wraback
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
Y. Fedyunin
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
T. D. Moustakas
Affiliation:
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, AMSRL-SE-EM, 2800 Powder Mill Road, Adelphi, MD 20783
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Abstract

A new technique is presented that employs luminescence downconversion using an ultrashort gating pulse to enable the characterization of UV light emission from III-nitride semiconductors with subpicosecond temporal resolution. This technique also allows one to measure PL rise times and fast components of multiple decays in the subsequent time evolution of the PL intensity. Comparison of luminescence emission intensity and lifetime in GaN and AlGaN with ∼0.1 Al content grown homoepitaxially on GaN templates with the same quantities measured in heteroepitaxial layers grown on sapphire indicate significant improvement in the homoepitaxial layers due to reduction in dislocation density. Fast (<15 ps) initial decays in the AlGaN are attributed to localization associated with alloy fluctuations and subsequent recombination through gap states.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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