Hostname: page-component-78c5997874-mlc7c Total loading time: 0 Render date: 2024-11-02T23:42:19.151Z Has data issue: false hasContentIssue false
  • English
  • Français

Study of Wsi2 and Cosi2 Thin Films Deposited by Laser Ablation

Published online by Cambridge University Press:  21 February 2011

V.G. Glebovsky ,
S.N. Ermolov ,
R.A. Oganyan  and
E.D. Stinov
V.G. Glebovsky
Affiliation:
Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka Moscow dist. 142432 Russia
S.N. Ermolov
Affiliation:
Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka Moscow dist. 142432 Russia
R.A. Oganyan
Affiliation:
Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka Moscow dist. 142432 Russia
E.D. Stinov
Affiliation:
Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka Moscow dist. 142432 Russia
Get access

Abstract

It has been shown, that pure massive targets of tungsten and cobalt disilicide can be obtain from the liquid state by means of a set of metallurgical methods. The conditions of laser ablation of the targets ensuring the preparation of tungsten and cobalt suicide films of the specific electric resistance 50 and 30 μΩ cm respectivly have been studied. The grazing beam X-ray difractometry were used to investigate their phase and elemental composition of the films. The method in question has been shown to be promising for the preparation of films of other refractory - metal suicides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 354: Symposium A – Beam Solid Interactions for Materials Synthesis and Characterization , 1994 , 659
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Murarka, S.P., Suicides for VLSI Application, Academic Press, New York, 1983.Google Scholar
2 Gaponov, S.V. and Salashenko, N.N., Electron, promishi., 1 (1976) 11 (in Russian).Google Scholar
3 Hirano, T. and Kaise, M., J. Appl. Phys., 68 (1990) 627.Google Scholar
4 Jung, M.H. and Cheng, H.C., Thin Solid Films, 215 (1992) 71.Google Scholar