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A Study of V3+/4+ Levels in Semi-insulating 6H-SiC using Optical Admittance and Electron Paramagnetic Resonance Spectroscopies

Published online by Cambridge University Press:  01 February 2011

Wonwoo Lee
Affiliation:
[email protected], University of Alabama at Birmingham, Materials Science and Engineering, 1530 3rd Ave S., Birmingham, 35294, United States
Mary E Zvanut
Affiliation:
[email protected], University of Alabama at Birmingham, Birmingham, 35294, United States
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Abstract

The purpose of this study is to identify the vanadium acceptor levels in semi-insulating (SI) 6H-SiC using optical admittance spectroscopy (OAS) and electron paramagnetic resonance (EPR) spectroscopy. OAS conductance peaks near at 0.67 ± 0.02 eV and 0.70 ± 0.02 eV are identified as V3+/4+ levels at the quasi-cubic sites. An OAS peak at 0.87 eV is assigned to the same transition at the hexagonal site. EPR measurements before illumination revealed the characteristic spectrum of V3+. The presence of the V3+ signal supports the identification of the OAS peaks as transitions from the V3+/4+ level to the conduction band. Photo-induced EPR measurements reveal a change in the intensity of V3+ and V4+ at 0.8 ± 0.1 eV, where the amplitude of the V3+ charge state decreases and that of V4+ increases by approximately equal amounts. Although the individual sites are not resolved in the photo-induced EPR data, the 0.8 eV feature strongly supports the assignment of the three OAS peaks as acceptor levels.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

1 Mitchel, W. C., Perrin, R., Goldstein, J. et al, J. Appl. Phys. 86, 5040 (1999).Google Scholar
2 Kunzer, M., Kaufmann, U., Maier, K. et al., Mater. Sci. and Eng. B29, 118 (1995).Google Scholar
3 Baur, J., Kunzer, M., and Schneider, J., Phys. Stat. Sol. (a) 162, 153 (1997).Google Scholar
4 Maier, K., Muller, H. D., Schneider, J. et al, Mater. Sci. Forum, 83–87, 1183 (1992).Google Scholar
5 Achtziger, N., Grillenberger, J., and Witthuhn, W., Appl. Phys. A 65, 329 (1997).Google Scholar
6 Lauer, V., Bremond, G., Souifi, A. et al., Mat. Sci. and Eng., B61–62, 248 (1999)Google Scholar
7 Lauer, V., Bremond, G., Souifi, A. et al., Mat. Sci. Forum, 338–342, 635 (2000).Google Scholar
8 Mitchel, W. C., Perrin, R., Goldstein, J. et al, Mater. Sci. Forum 264–268, 545 (1998).Google Scholar
9 Evwaraye, A. O., Smith, S. R., and Mitchel, W. C., J. Appl. Phys. 79, 253 (1996)Google Scholar
10 Prezzi, D., Eberlein, T. A. G., J. S. Filhol et al.: Phys. Rev. B 69, 93202 (2004)Google Scholar
11 Lee, Wonwoo, Zvanut, M. E., J. Appl. Phys. Submitted, (2005)Google Scholar