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Published online by Cambridge University Press: 25 February 2011
We have performed high resolution x-ray diffraction measurements of the strain field in UHV deposited Ag(111) films on a 7×7 reconstructed Si(111) surfaces shows a faulted epitaxial layer with a 0.4% out-of-plane strain, and a -1% in-plane strain. The strain field anisotropy is similar to that observed on epitaxial YSi2-x on Si(111), and is an unexpected result for the present system, due to the lack of a lattice match between the silver and silicon unit cells. The out-of-plane diffraction peaks have an angular distribution of 1.23°, full width at half maximum (FWHM), as determined from rocking curve measurements.