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Silicon Surface Chemical Treatments in Oxide/Nitride Dielectric Stack Properties

Published online by Cambridge University Press:  01 February 2011

D. Jacques ,
S. Petitdidier ,
J.L. Regolini  and
K. Barla
D. Jacques
Affiliation:
STMicroelectronics, 850 rue J. Monnet F-38926 Crolles–France. [email protected]
S. Petitdidier
Affiliation:
STMicroelectronics, 850 rue J. Monnet F-38926 Crolles–France. [email protected]
J.L. Regolini
Affiliation:
STMicroelectronics, 850 rue J. Monnet F-38926 Crolles–France. [email protected]
K. Barla
Affiliation:
STMicroelectronics, 850 rue J. Monnet F-38926 Crolles–France. [email protected]
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Abstract

Oxide/Nitride dielectric stack is widely used as the standard dielectric for DRAM capacitors. The influence of the chemical cleaning prior to the stack formation has been studied in this work. As a result, morphological data such as stack surface roughness (Atomic Force Microscopy) and silicon nitride (SiN) incubation time for growth are comparable for all the studied cases on <Si>. However, Tof-SIMS exhibits different oxygen content at the Si/stack interface following the different chemical treatments. Electrical measurements show comparable C-V and I-V results, for the same Equivalent Oxide Thickness (same capacitance at strong accumulation i.e.-3V) while the different studied interfaces bring different interface states density with lower values for higher interfacial oxygen content. For DRAM applications, a clear improvement in electrical characteristics is obtained under low interfacial oxygen content conditions. Results are compared in embedded-DRAM cells for which we developed an industrially compatible dielectric deposition sequence to obtain minimum leakage current with maximum specific capacitance and no particular linking constraints.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 716: Symposium B – Silicon Materials-Processing, Characterization, and Reliability , 2002 , B7.8
Copyright
Copyright © Materials Research Society 2002

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References

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