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Self Assembled Patterns of Gold Nanoclusters in Silicon (100) Produced by Metal Vapour Vacuum Arc Ion Implantation

Published online by Cambridge University Press:  01 February 2011

Dinesh Kumar Venkatachalam ,
Dinesh Kumar Sood  and
Suresh Kumar Bhargava
Dinesh Kumar Venkatachalam
Affiliation:
[email protected], RMIT University, School of Applied Sciences, 124, La Trobe Street, Melbourne, 3001, Australia, +61 3 9925 2127
Dinesh Kumar Sood
Affiliation:
[email protected], RMIT University, School of Electrical and Computer Engineering, 124, La Trobe Street, Melbourne, 3001, Australia
Suresh Kumar Bhargava
Affiliation:
[email protected], RMIT University, School of Applied Sciences, 124, La Trobe Street, Melbourne, 3001, Australia
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Abstract

Self assembled gold nanoclusters are attractive building blocks for future nanoscale sensors and optical devices due to their exciting catalytic properties. Recently several methods have been employed to produce nanoclusters on solid substrates, which result in a random spatial distribution of the clusters. In this work, we have achieved ordered circular patterns of gold nanoclusters in Silicon (100) substrates by Au ion implantation followed by thermal annealing. This unique phenomenon is observed only above a critical threshold implantation dose and anneal temperature. Based on a systematic study (SEM, XTEM and XRD) of the growth and morphology of the nanoclusters, we propose a tentative model for the formation mechanism of this unusual self-assembled pattern.

Keywords

ion-implantationAuself-assembly
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 960: Symposium N – Self Assembly of Nanostructures Aided by Ion- or Photon-Beam Irradiation—Fundamentals and Applications , 2006 , 0960-N11-04
Copyright
Copyright © Materials Research Society 2007

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References

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