Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-04T17:58:59.643Z Has data issue: false hasContentIssue false
  • English
  • Français

The Scattering Distribution from Semiconductors as a Function of Angle and Energy Loss in the Electron Microscope

Published online by Cambridge University Press:  10 February 2011

C. B. Boothroyd ,
R. E. Dunin-Borkowski  and
T. Walther
C. B. Boothroyd
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK
R. E. Dunin-Borkowski
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK
T. Walther
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK
Get access

Abstract

We examine the scattering distribution from thin C, Ge and thick Si specimens as a function of scattering angle and energy loss, in order to gain insight into the relative contributions to both low and high angle annular dark field images from elastically and inelastically scattered elections.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 466: Symposium G – Atomic Resolution Microscopy of Surfaces and Interfaces , 1996 , 113
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Pennycook, S. J. and Jesson, D. E., Phys. Rev. Lett. 64, p. 938 (1990)Google Scholar
2. Pennyeook, S. J. and Jesson, D. E., Ultramicrosc. 37, p. 14 (1991)Google Scholar
3. Liu, J. and Cowlcy, J. M., Ultramicrosc. 37 p. 50 (1991)Google Scholar
4. Bleloch, A. L., Castell, M. R., Howie, A. and Walsh, C. A., Ultramicrosc. 54, p. 107 (1994)Google Scholar
5. Perovic, D. D., Wealherly, G. C., Egerton, R. F., Houghton, D. C and Jackman, T. E., Phil. Mag. A 63, p. 757(1991)Google Scholar
6. Spence, J. C. H., Zuo, J. M. and Lynch, J., Ullramicrosc. 31, p. 233 (1989)Google Scholar
7. Hillyard, Sean and Silcox, John, Ultramicrosc. 58, p. 6 (1995)Google Scholar
8. Wang, Z. L., Elastic and Inelastic Scattering in Electron Diffraction and Imaging, Plenum, New York, 1995 Google Scholar
9. Wang, Z. L. and Cowley, J. M., Ultramicrosc. 31, p. 437 (1989)Google Scholar
10. Eaglesham, D. J. and Berger, S. D., Ultramicrosc. 53, p. 319 (1994)Google Scholar
11. Treacy, M. M. J. and Gibson, J. M., Ultramicrosc. 52, p. 31 (1993)Google Scholar