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Roll-to-Roll Graphene Synthesis by Using Microwave Plasma Chemical Vapor Deposition at Low Temperature

Published online by Cambridge University Press:  16 July 2012

Takatoshi Yamada
Affiliation:
Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba 305-8565, Japan
Masatou Ishihara
Affiliation:
Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba 305-8565, Japan
Jaeho Kim
Affiliation:
Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba 305-8565, Japan
Masataka Hasegawa
Affiliation:
Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba 305-8565, Japan
Sumio Iijima
Affiliation:
Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba 305-8565, Japan
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Abstract

We reported continuous depositions of grahene films on copper foils with A4 width using roll-to-toll microwave plasma chemical vapor deposition (MWPCVD) technique. A pair of winder and unwinder was built into an MWPCVD apparatus. Surface-wave plasma enabled us to deposit large-area graphene film (substrate stage is of 480 mm x 300 mm) at temperatures below 400 ºC. In Raman spectra, G- and G’-band attributed to graphene were obtained. In addition, Dand D’-band originated from defects and/or edges were detected. These results suggested that the obtained graphene films consisted of flake boundaries and defects. After the transferring graphene onto the polyethylene terephthalate film, uniform transmittance and sheet resistance were confirmed.

Type
Articles
Copyright
Copyright © Materials Research Society 2012

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References

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