Hostname: page-component-78c5997874-94fs2 Total loading time: 0 Render date: 2024-11-04T18:06:59.986Z Has data issue: false hasContentIssue false

The Role Played By Two Parallel Free Surfaces In The Deformation Mechanism Of Nano-crystalline Metals: A Molecular Dynamics Simulation

Published online by Cambridge University Press:  14 March 2011

P. M. Derlet
Affiliation:
Paul Scherrer Institute, CH-5253 Villigen PSI, Switzerland
H. Van Swygenhoven
Affiliation:
Paul Scherrer Institute, CH-5253 Villigen PSI, Switzerland
Get access

Abstract

Former molecular dynamics computer simulations of polycrystalline Ni and Cu metals with mean grain sizes ranging between 3 and 12 nm demonstrated a change in deformation mechanism as a function of grain size: at the smallest grain sizes all deformation is accommodated in the grain boundaries. In this paper we report on the influence of the presence of two free surfaces on the deformation behaviour. The purpose of this simulation is to study which phenomena observed in in-situ tensile experiments performed in the electron microscope can be expected to be intrinsic properties of the deformation process and which phenomena are due to the presence of two free surfaces separated by a very small distance.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Nieman, W., Weertman, J. R., and Siegel, R. W., J. Mater. Res. 6, 1012 (1991)Google Scholar
2. Nieh, G. and Wadsworth, J., Scr Metall. Mater. 25, 955 (1991)Google Scholar
3. Chokshi, H., Rosen, A., Karch, J., and Gleiter, H., Scr. Metall. Mater. 23, 1679 (1989).Google Scholar
4. Gerlsman, Y., Hoffmann, M., Gleiter, H., and Birringet, R., Acta Metall. Mater. 42, 3539 (1994)Google Scholar
5. Siegel, W. and Fougere, G. E., Nanostruct. Mater. 6, 205 (1995)Google Scholar
6. Swygenhoven, Van and Caro, A., Appl. Phys. Lett. 71, 1652 (1997)Google Scholar
7. Swygenhoven, Van and Caro, A., Phys. Rev. B 58, 11246 (1998)Google Scholar
8. Swygenhoven, Van, Spaczer, M., Farkas, D., and Caro, A., Phys. Rev. B 60, 22 (1999)Google Scholar
9. Swygenhoven, Van, Spaczer, M., and Caro, A., Acta Mater. 47, 3117 (1999)Google Scholar
10. Swygenhoven, Van, Farkas, D., and Caro, A., Phys. Rev. B 62, 831 (2000)Google Scholar
11. , Kizuka, Mitarai, N., and Tanaka, N., J. Mater. Sci. 29, 5599 (1994)Google Scholar
12. Hugo, C., Kung, H., Youngdahl, C. J. and Weertman, J., See present volume.Google Scholar
13. McFadden, X., Sergueeva, A.V., and Mukherjee, A.K., See present volume.Google Scholar
14. Voronoi, Z., J. Reine Angew. Math 134, 199 (1908)Google Scholar
15. , Parrinello and Rahman, A., J. Appl. Phys. 52, 12 (1981)Google Scholar
16. Cleri, F. and Rosato, V., Phys. Rev. B 48, 22 (1993)Google Scholar
17. Honneycutt, D. J. and Andersen, H. C., J. Phys. Chem. 91, 4950 (1987)Google Scholar