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Reversible Nanoscale Local Wettability Modifications by Thermochemcial Nanolithography

Published online by Cambridge University Press:  01 February 2011

Debin Wang ,
Takashi Okada ,
Robert Szoszkiewicz ,
Simon C Jones ,
Marcel Lucas ,
Jungchul Lee ,
William P King ,
Seth R Marder  and
Elisa Riedo
Debin Wang
Affiliation:
[email protected], Georgia Institute of Technology, School of Physics, 837 State St., Atlanta, GA, 30332, United States, 404-894-0941, 404-894-9958
Takashi Okada
Affiliation:
[email protected], Georgia Institute of Technology, School of Chemistry and Biochemistry, 901 Atlantic Drive, Atlanta, GA, 30332, United States
Robert Szoszkiewicz
Affiliation:
[email protected], Georgia Institute of Technology, School of Physics, 837 State Street, Atlanta, GA, 30332, United States
Simon C Jones
Affiliation:
[email protected], Georgia Institute of Technology, School of Chemistry and Biochemistry, 901 Atlantic Drive, Atlanta, GA, 30332, United States
Marcel Lucas
Affiliation:
[email protected], Georgia Institute of Technology, School of Physics, 837 State Street, Atlanta, GA, 30332, United States
Jungchul Lee
Affiliation:
[email protected], University of Illinis Urbana-Champaign, Department of Mechanical Science and Engineering, 1206 W. Green Street, Urbana, IL, 61801, United States
William P King
Affiliation:
[email protected], University of Illinis Urbana-Champaign, Department of Mechanical Science and Engineering, 1206 W. Green Street, Urbana, IL, 61801, United States
Seth R Marder
Affiliation:
[email protected], Georgia Institute of Technology, School of Chemistry and Biochemistry, 901 Atlantic Drive, Atlanta, GA, 30332, United States
Elisa Riedo
Affiliation:
[email protected], Georgia Institute of Technology, School of Physics, 837 State Street, Atlanta, GA, 30332, United States
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Abstract

Recently, the development of a versatile thermochemical nanolithography (TCNL) technique has been reported. It allows simultaneous control of the local chemistry and topography of thin polymer films. This technique can pattern sub 15 nm chemical and topographical features at the rate of 1.4 mm per second by inducing thermally-activated chemical reactions by means of a heated atomic force microscope (AFM) tip. TCNL is achievable in different environments and can easily be adapted to a variety of substrates and chemical functionalities. Here, we demonstrate that a thin polymer film can be chemically modified twice using TCNL to tune its wettability. We are able to write hydrophilic nanopatterns over a hydrophobic polymer surface upon a first step heating and then revert back to hydrophobic surface by a second step heating. This write-read-overwrite capability is particularly useful in data storage application and complex nanofluidic device design.

Keywords

scanning probe microscopy (SPM)nanoscalelithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1059: Symposium KK – Nanoscale Pattern Formation , 2007 , 1059-KK10-36
Copyright
Copyright © Materials Research Society 2008

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References

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