Hostname: page-component-586b7cd67f-tf8b9 Total loading time: 0 Render date: 2024-11-28T06:36:05.756Z Has data issue: false hasContentIssue false

Reliability studies of pentacene based thin film transistors

Published online by Cambridge University Press:  11 July 2012

R. Ledru
Affiliation:
CReSTIC, University of Reims, Moulin de la Housse, 51687 Reims Cedex 2 (France).
S. Pleutin
Affiliation:
CReSTIC, University of Reims, Moulin de la Housse, 51687 Reims Cedex 2 (France). IEMN UMR CNRS, University of Lille, BP 60069, Avenue Poincaré, 59652 Villeneuve d’Ascq Cedex (France).
B. Grouiez
Affiliation:
CReSTIC, University of Reims, Moulin de la Housse, 51687 Reims Cedex 2 (France).
D. Zander
Affiliation:
CReSTIC, University of Reims, Moulin de la Housse, 51687 Reims Cedex 2 (France).
H. Bejbouji
Affiliation:
CReSTIC, University of Reims, Moulin de la Housse, 51687 Reims Cedex 2 (France). IEMN UMR CNRS, University of Lille, BP 60069, Avenue Poincaré, 59652 Villeneuve d’Ascq Cedex (France).
K. Lmimouni
Affiliation:
IEMN UMR CNRS, University of Lille, BP 60069, Avenue Poincaré, 59652 Villeneuve d’Ascq Cedex (France).
D. Vuillaume
Affiliation:
IEMN UMR CNRS, University of Lille, BP 60069, Avenue Poincaré, 59652 Villeneuve d’Ascq Cedex (France).
Get access

Abstract

The complex admittance of the Si+/SiO2/Pentacene/Au (metal/oxide/pentacene) thin film junctions is investigated under ambient conditions. The results are compared with the ones obtained for the corresponding Si+/SiO2/Au junctions (i.e. a small part of the surface left free from pentacene) which constitutes the “reference” of our samples. This allows us to extract the “organic” part of the dielectric response from the whole spectrum. Our data clearly show that the admittance is decomposed in three main contributions. At low frequencies, a contribution attributed to proton diffusion through the oxide is seen. This diffusion is shown to be anomalous and is believed to be also at the origin of the bias stress effect observed in organic field effect transistors. At higher frequencies, two dipolar contributions are evidenced, attributed to defects located one at the organic/oxide interface or within the organic, and the other in the bulk of the oxide. These two dipolar responses show different dynamic properties that manifest themselves in the admittance in the form of a Debye contribution for the defects located in the oxide, and of a Cole-Cole contribution for the defects related to the organic.

Type
Articles
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Sirringhaus, H., Adv. Mater. 2009, 21, 3859.Google Scholar
[2] Sharma, A., Mathijssen, S.G.J., Kemerink, M., de Leeuw, D.M., and Bobbert, P.A., Appl. Phys. Lett. 2009, 95, 253305.Google Scholar
[3] Sharma, A., Mathijssen, S.G.J., Smits, E.C.P., Kemerink, M., de Leeuw, D.M., and Bobbert, P.A., Phys. Rev. B. 2010, 82, 075322.Google Scholar
[4] Clément, N., Pleutin, S., Guérin, D., and Vuillaume, D., Phys. Rev. B. 2010, 82, 035404.Google Scholar
[5] Pleutin, S., Clément, N., Guérin, D., and Vuillaume, D., Phys. Rev. B. 2010, 82, 125436.Google Scholar
[6] Raju, G.G., Dielectrics in Electric Field (Marcel Dekker, New York, Basel, 2003).Google Scholar
[7] Dissado, L.A. and Hill, R.M., J. Chem. Soc. Faraday Trans. 2 1984, 80, 291.Google Scholar
[8] Bisquert, J. et al. , J. Electroanalytical Chemistry, 1999, 475, 152.Google Scholar
[9] Jonscher, A.K., Universal relaxation law, Chelsea Dielectrics Press, 1996.Google Scholar