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Refractive Index Profiles of High Dose Ti Implanted Optical Waveguides in LiNbO3

Published online by Cambridge University Press:  25 February 2011

T. Bremer ,
P.R. Ashley ,
R. Irmscher  and
Ch. Buchal
T. Bremer
Affiliation:
University of Osnabrück, D-4500 Osnabrück, FRG
P.R. Ashley
Affiliation:
Research Directorate, USAML Redstone Arsenal, AL 35898
R. Irmscher
Affiliation:
Inst. Schicht- und Ionentechnik, KFA, D-5170 Jülich, FRG
Ch. Buchal
Affiliation:
Inst. Schicht- und Ionentechnik, KFA, D-5170 Jülich, FRG
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Abstract

Single crystalline substrates of LiNb03 have been implanted with 48Ti ions at 200 keV and doses up to 4 × 1017 cm−2. The implants have been performed at wafer temperatures of 77 K, 300 K and 620 K. Immediate subsequent processing at 1273 K in wet oxygen ambient led to good epitaxial regrowth at all doses, if sufficient time was allowed. The maximum observed extraordinary refractive index change after regrowth Δne=0.04, indicating a solubility limit of 3.3×l021 Ti cm−3 corresponding to 18 % of Nb5+ replaced by Ti4+.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 525
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1 Korotky, S.K. in Integrated Optical Circuits, edt. Hutcheson, L.D. (Marcel Dekker, New York, 1987)Google Scholar
2 Electro-optic and Photorefractive Materials, Springer Proc. Phys. .18, ed. P. Gunter, 179 (Berlin 1987)Google Scholar
3 Ashley, P.R., Chang, W.S.C., Bûchai, Ch. and Thomas, D.K., IEEE J. Lightw. Technol. 7, 855 (1989)Google Scholar
4 Bûchai, Ch., Ashley, P.R. and Appleton, B.R., J. Mater. Res. 2, 222 (1987)Google Scholar
5 Bûchai, Ch., Irmscher, R. and Gunter, P., Mat. Res. Soc. Symp. Proc. 128, 719 (1989)Google Scholar
6 Ziegler, J.F., Biersack, J.P. and Littmark, U., Stopping and Ranges of Ions in Matter (Pergamon Press, N.Y., 1985)Google Scholar
7 Hertel, P. and Menzler, H.P., Appl. Phys. B44, 75 (1987)Google Scholar
8 Bremer, T., Heiland, W., Bûchai, Ch., Irmscher, R. and Stritzker, B., J. Appl. Phys., in press (1989/1990)Google Scholar
9 Vollmer, J., Nisius, J.P., Hertel, P. and Krâtzig, E., Appl. Phys. A32, 125 (1983)Google Scholar