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Raman Studies Of LiMn2O4 Films Grown by Laser Ablation

Published online by Cambridge University Press:  10 February 2011

M.A. Camacho-Lopez
Affiliation:
LMDH, UMR 7603, Université Pierre et Marie Curie, 4 place Jussieu, case 86 75252 Paris cedex 05, France Laboratorio de Optica Cuantica, Universidad Autónoma Metropolitana lztapalapa Apdo., Postal 55-534, México DF 09340, México
L. Escobar-Alarcon
Affiliation:
Departamento de Fisica, Instituto Nacional de Investigaciones Nucleares Apdo., Postal 18-1027, México DF 11801, México
E. Haro-Poniatowski
Affiliation:
Laboratorio de Optica Cuantica, Universidad Autónoma Metropolitana lztapalapa Apdo., Postal 55-534, México DF 09340, México
C. Julieni
Affiliation:
LMDH, UMR 7603, Université Pierre et Marie Curie, 4 place Jussieu, case 86 75252 Paris cedex 05, France
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Abstract

Polycrystalline thin films of lithium manganese oxide have been grown using the pulsed-laser deposition (PLD) technique. Films of LiMnO2O4, were deposited onto Si substrates heated at temperature lower than 300°C from a sintered composite target (LiMn2O4+Li2O) irradiated with a Nd:YAG laser. The structural characterizations of these films have been carried out by Raman scattering spectroscopy which probe the local environment of cations in the LiMn2O4 framework. Raman spectra of PLD LiMn2O4 films have been investigated as a function of various growth conditions, i.e. substrate temperature, partial oxygen pressure in the deposition chamber, and target composition.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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