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Published online by Cambridge University Press: 21 February 2011
A plasma-enhanced organometallic chemical vapor deposition (PE-OMCVD) has been studied as an alternative plasma process to prepare high Tc superconducting thin films. Metal β–diketonates such as Y(fod)3, Ba(hfa)2 and Cu(hfa)2 were decomposed by Ar/O2 plasmas produced with an applicator type microwave discharge system. Optical emission spectroscopy was used to monitor radical species during vaporization and decomposition of the source materials. The YBaCuO films grown on substrates(MgO, SrTiO3 and c-Si) showed amorphous structure. After the post-annealing, the films exhibited an x-ray diffraction pattern with c-axis perpendicular to the substrate and showed an onset superconducting transition temperature of 87 K. The PE-OMCVD process provided high film deposition rate of 30–120 nm/min.